John M. Sivertsen

Affiliations: 
University of Minnesota, Twin Cities, Minneapolis, MN 
Area:
Materials Science Engineering
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"John Sivertsen"

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Supattanapong Dumrongrattana grad student UMN (Physics Tree)
Eric S. Linville grad student 2000 UMN
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Publications

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Peng W, Victora RH, Judy JH, et al. (2000) Perpendicular magnetic recording thin film media using Co/Pd superlattice on ultrathin indium–tin–oxide seed layers Journal of Applied Physics. 87: 6358-6360
Qian Z, Sivertsen JM, Judy JH, et al. (1999) Exchange coupling of radio frequency sputtered NiMn/NiFe and NiFe/NiMn bilayers Journal of Applied Physics. 85: 6106-6108
Yang C, Sivertsen JM, Li T, et al. (1999) Experimental determination of the distribution of relaxation time for thermally activated transition in thin film magnetic recording media Journal of Applied Physics. 85: 5000-5002
Qian Z, Kief MT, George PK, et al. (1999) Kerr effect observations of magnetization reversal process in antiferromagnetically pinned permalloy thin films Journal of Applied Physics. 85: 5525-5527
Yang C, Sivertsen JM, Judy JH. (1998) Time decay of the remanent magnetization in longitudinal thin film recording media as a function of distributions of grain size and easy-axis orientation Ieee Transactions On Magnetics. 34: 1606-1608
Yeh T, Sivertsen JM, Lin C-. (1998) Preferred crystal orientation of NiFe underlayers and its effect on magnetostriction of Co/Cu/Co thin films Ieee Transactions On Magnetics. 34: 870-872
Qian Z, Sivertsen JM, Judy JH. (1998) Magnetic behavior of NiFe/NiO bilayers Journal of Applied Physics. 83: 6825-6827
Sivertsen J, Wang G, Chen G, et al. (1997) DIAMOND-LIKE CARBON FILMS as WEAR-PROTECTIVE COATINGS on MEDIA and HEAD SLIDERS Journal of the Magnetics Society of Japan. 21: S2_89-94
Yang C, Sivertsen JM, Judy JH. (1997) Effects of Grain-Size Distribution on Time Dependence of the Remanent Magnetization in Thin Film Recording Media Journal of the Magnetics Society of Japan. 21
Qian Z, Wang G, Sivertsen JM, et al. (1997) NiZn ferrite thin films prepared by Facing Target Sputtering Ieee Transactions On Magnetics. 33: 3748-3750
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