| Year |
Citation |
Score |
| 2011 |
Onses MS, Pathak P, Liu CC, Cerrina F, Nealey PF. Localization of multiple DNA sequences on nanopatterns. Acs Nano. 5: 7899-909. PMID 21899356 DOI: 10.1021/Nn2021277 |
0.34 |
|
| 2010 |
Marconi MC, Wachulak P, Urbanski L, Menoni CS, Rocca JJ, Isoyan A, Jiang F, Cheng Y, Cerrina F. Extreme ultraviolet lasers demonstrate new nano-patterning schemes 2010 23rd Annual Meeting of the Ieee Photonics Society, Photinics 2010. 335-336. DOI: 10.1109/Photonics.2010.5698896 |
0.781 |
|
| 2009 |
Chen S, Phillips MF, Cerrina F, Smith LM. Controlling oligonucleotide surface density in light-directed DNA array fabrication. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 6570-5. PMID 19281155 DOI: 10.1021/La9000297 |
0.303 |
|
| 2009 |
Urbanski L, Wachulak PW, Isoyan A, Jian F, Cheng Y, Rocca JJ, Menoni CS, Marconi MC, Cerrina F. Table Top Schemes for Nano-Patterning with Extreme Ultraviolet Lasers Frontiers in Optics. DOI: 10.1364/Fio.2009.Ftus2 |
0.766 |
|
| 2009 |
Marconi MC, Wachulak PW, Urbanski L, Isoyan A, Jiang F, Cheng YC, Rocca JJ, Menoni CS, Cerrina F. Table-top soft X ray lithography Proceedings of Spie - the International Society For Optical Engineering. 7451. DOI: 10.1117/12.825509 |
0.385 |
|
| 2009 |
Wang T, Quaglio M, Pirri F, Cheng Y, Busacker D, Cerrina F. Patterning of SU-8 resist with digital micromirror device (DMD) maskless lithography Proceedings of Spie. 7274. DOI: 10.1117/12.814831 |
0.784 |
|
| 2009 |
Isoyan A, Jiang F, Cheng YC, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M, Cerrina F. Extreme Ultraviolet Holographic Lithography with a table-top laser Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814678 |
0.365 |
|
| 2009 |
Jiang F, Cheng YC, Isoyan A, Cerrina F. Engineering study of extreme ultraviolet interferometric lithography Journal of Micro/Nanolithography, Mems, and Moems. 8. DOI: 10.1117/1.3112006 |
0.781 |
|
| 2009 |
Negrete OD, Onses MS, Nealy PF, Cerrina F. In situ synthesis and direct immobilization of ssDNA on electron beam patterned hydrogen silsesquioxane Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 3082-3087. DOI: 10.1116/1.3263190 |
0.773 |
|
| 2009 |
Isoyan A, Jiang F, Cheng YC, Cerrina F, Wachulak P, Urbanski L, Rocca J, Menoni C, Marconi M. Talbot lithography: Self-imaging of complex structures Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 27: 2931-2937. DOI: 10.1116/1.3258144 |
0.406 |
|
| 2008 |
Isoyan A, Wüest A, Wallace J, Jiang F, Cerrina F. 4X reduction extreme ultraviolet interferometric lithography. Optics Express. 16: 9106-11. PMID 18545622 DOI: 10.1364/Oe.16.009106 |
0.367 |
|
| 2008 |
Phillips MF, Lockett MR, Rodesch MJ, Shortreed MR, Cerrina F, Smith LM. In situ oligonucleotide synthesis on carbon materials: stable substrates for microarray fabrication. Nucleic Acids Research. 36: e7. PMID 18084027 DOI: 10.1093/Nar/Gkm1103 |
0.306 |
|
| 2008 |
Brainard R, Hassanein E, Li J, Pathak P, Thiel B, Cerrina F, Moore R, Rodriguez M, Yakshinskiy B, Loginova E, Madey T, Matyi R, Malloy M, Rudack A, Naulleau P, et al. Photons, electrons, and acid yields in EUV photoresists: A progress report Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.773869 |
0.37 |
|
| 2008 |
Isoyan A, Cheng YC, Jiang F, Wallace J, Efremov M, Nealey P, Cerrina F. Progress in extreme ultraviolet interferometric lithography at the University of Wisconsin Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772681 |
0.78 |
|
| 2008 |
Cerrina F, Isoyan A, Jiang F, Cheng YC, Leonard Q, Wallace J, Heinrich K, Ho A, Efremov M, Nealey P. Extreme Ultraviolet Interferometric Lithography: A Path to Nanopatterning Synchrotron Radiation News. 21: 12-24. DOI: 10.1080/08940880802268236 |
0.387 |
|
| 2008 |
Negrete OD, Cerrina F. Step-and-scan maskless lithography for ultra large scale DNA chips Microelectronic Engineering. 85: 834-837. DOI: 10.1016/J.Mee.2008.01.014 |
0.769 |
|
| 2007 |
Huang W, Cerrina F. The con-focal method on verifying focal plane of MAS machine. Optics Express. 15: 872-7. PMID 19532313 DOI: 10.1364/Oe.15.000872 |
0.315 |
|
| 2007 |
Isoyan A, Cheng YC, Jiang F, Wallace J, Cerrina F, Bollepalli S. Progress in extreme ultraviolet interferometric and holographic lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2145-2150. DOI: 10.1116/1.2794069 |
0.341 |
|
| 2007 |
Ma Y, Cheng YC, Cerrina F, Barwicz T, Smith HI. Local line edge roughness in microphotonic devices: An electron-beam lithography study Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 235-241. DOI: 10.1116/1.2426978 |
0.788 |
|
| 2007 |
Cheng YC, Isoyan A, Wallace J, Khan M, Cerrina F. Extreme ultraviolet holographic lithography: Initial results Applied Physics Letters. 90. DOI: 10.1063/1.2430774 |
0.791 |
|
| 2007 |
Wallace J, Cheng Y, Isoyan A, Leonard Q, Fisher M, Green M, Bisognano J, Nealey P, Cerrina F. A novel EUV exposure station for nanotechnology studies Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 582: 254-257. DOI: 10.1016/J.Nima.2007.08.124 |
0.798 |
|
| 2006 |
Blair S, Richmond K, Rodesch M, Bassetti M, Cerrina F. A scalable method for multiplex LED-controlled synthesis of DNA in capillaries. Nucleic Acids Research. 34: e110. PMID 16963493 DOI: 10.1093/Nar/Gkl641 |
0.669 |
|
| 2006 |
Flickinger ST, Patel M, Binkowski BF, Lowe AM, Li MH, Kim C, Cerrina F, Belshaw PJ. Spatial photorelease of oligonucleotides, using a safety-catch photolabile linker. Organic Letters. 8: 2357-60. PMID 16706525 DOI: 10.1021/Ol060644X |
0.763 |
|
| 2006 |
Kim C, Kaysen J, Richmond K, Rodesch M, Binkowski B, Chu L, Li M, Heinrich K, Blair S, Belshaw P, Sussman M, Cerrina F. Progress in gene assembly from a MAS-driven DNA microarray Microelectronic Engineering. 83: 1613-1616. DOI: 10.1016/J.Mee.2006.01.143 |
0.307 |
|
| 2005 |
Ma Y, Cerrina F. Effect of a surface inhibition layer on line edge roughness Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 1096-1101. DOI: 10.1116/1.1926292 |
0.645 |
|
| 2005 |
Junarsa I, Stoykovich MP, Nealey PF, Ma Y, Cerrina F, Solak HH. Hydrogen silsesquioxane as a high resolution negative-tone resist for extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 138-143. DOI: 10.1116/1.1849213 |
0.639 |
|
| 2005 |
Gonsalves KE, Thiyagarajan M, Choi JH, Zimmerman P, Cerrina F, Nealey P, Golovkina V, Wallace J, Batina N. High performance resist for EUV lithography Microelectronic Engineering. 77: 27-35. DOI: 10.1016/J.Mee.2004.08.003 |
0.38 |
|
| 2004 |
Shaginian A, Patel M, Li MH, Flickinger ST, Kim C, Cerrina F, Belshaw PJ. Light-directed radial combinatorial chemistry: orthogonal safety-catch protecting groups for the synthesis of small molecule microarrays. Journal of the American Chemical Society. 126: 16704-5. PMID 15612691 DOI: 10.1021/Ja044702Q |
0.744 |
|
| 2004 |
Richmond KE, Li MH, Rodesch MJ, Patel M, Lowe AM, Kim C, Chu LL, Venkataramaian N, Flickinger SF, Kaysen J, Belshaw PJ, Sussman MR, Cerrina F. Amplification and assembly of chip-eluted DNA (AACED): a method for high-throughput gene synthesis. Nucleic Acids Research. 32: 5011-8. PMID 15448182 DOI: 10.1093/Nar/Gkh793 |
0.763 |
|
| 2004 |
Malueg DH, Taylor JW, Thielman D, Leonard Q, Dhuey S, Cerrina F. Modeling, fabrication, and experimental application of clear x-ray phase masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3575-3580. DOI: 10.1116/1.1809626 |
0.375 |
|
| 2004 |
Amy D, Jiang L, Zheng R, Feldman M, Cerrina F, Dhuey S, Leonard Q, Thielman D. Minimal zone plates for x-ray lithography Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22: 3570. DOI: 10.1116/1.1809625 |
0.356 |
|
| 2003 |
Han G, Khan M, Cerrina F. Stochastic modeling of high energy lithographies Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3166. DOI: 10.1116/1.1627798 |
0.777 |
|
| 2003 |
Ma Y, Tsvid G, Cerrina F. Line edge roughness of sub-100 nm dense and isolated features: Experimental study Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 21: 3124. DOI: 10.1116/1.1624254 |
0.644 |
|
| 2003 |
Ma Y, Shin J, Cerrina F. Line edge roughness and photoresist percolation development model Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 112-117. DOI: 10.1116/1.1534572 |
0.763 |
|
| 2003 |
Azam Ali M, Gonsalves KE, Golovkina V, Cerrina F. High sensitivity nanocomposite resists for EUV lithography Microelectronic Engineering. 65: 454-462. DOI: 10.1016/S0167-9317(03)00164-3 |
0.374 |
|
| 2003 |
Solak HH, David C, Gobrecht J, Golovkina V, Cerrina F, Kim SO, Nealey PF. Sub-50 nm period patterns with EUV interference lithography Microelectronic Engineering. 67: 56-62. DOI: 10.1016/S0167-9317(03)00059-5 |
0.366 |
|
| 2002 |
Nuwaysir EF, Huang W, Albert TJ, Singh J, Nuwaysir K, Pitas A, Richmond T, Gorski T, Berg JP, Ballin J, McCormick M, Norton J, Pollock T, Sumwalt T, Butcher L, ... ... Cerrina F, et al. Gene expression analysis using oligonucleotide arrays produced by maskless photolithography. Genome Research. 12: 1749-55. PMID 12421762 DOI: 10.1101/Gr.362402 |
0.308 |
|
| 2002 |
Shin J, Ma Y, Cerrina F. Depth dependence of resist line-edge roughness: Relation to photoacid diffusion length Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2927-2931. DOI: 10.1116/1.1526638 |
0.789 |
|
| 2002 |
Han G, Khan M, Fang Y, Cerrina F. Comprehensive model of electron energy deposition Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 2666-2671. DOI: 10.1116/1.1526633 |
0.76 |
|
| 2002 |
Yang L, Cerrina F, Taylor JW. Bright peak enhanced x-ray clear phase mask Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 250-256. DOI: 10.1116/1.1434973 |
0.328 |
|
| 2002 |
Solak HH, David C, Gobrecht J, Wang L, Cerrina F. Four-wave EUV interference lithography Microelectronic Engineering. 61: 77-82. DOI: 10.1016/S0167-9317(02)00579-8 |
0.336 |
|
| 2001 |
Lee KK, Lim DR, Kimerling LC, Shin J, Cerrina F. Fabrication of ultralow-loss Si/SiO(2) waveguides by roughness reduction. Optics Letters. 26: 1888-90. PMID 18059727 DOI: 10.1364/Ol.26.001888 |
0.761 |
|
| 2001 |
Shin J, Han G, Ma Y, Moloni K, Cerrina F. Resist line edge roughness and aerial image contrast Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2890-2895. DOI: 10.1116/1.1418413 |
0.743 |
|
| 2001 |
Khan M, Han G, Tsvid G, Kitayama T, Maldonado J, Cerrina F. Can proximity x-ray lithography print 35 nm features? Yes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2423-2427. DOI: 10.1116/1.1418407 |
0.794 |
|
| 2001 |
Toyota E, Hori T, Khan M, Cerrina F. Technique for 25 nm x-ray nanolithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2428-2433. DOI: 10.1116/1.1415503 |
0.408 |
|
| 2001 |
Feldman M, Khan M, Cerrina F. Focusing x-ray masks for printing very narrow features Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 19: 2434-2438. DOI: 10.1116/1.1410093 |
0.323 |
|
| 2000 |
Han G, Cerrina F. Energy transfer between electrons and photoresist: Its relation to resolution Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3297-3302. DOI: 10.1116/1.1318188 |
0.769 |
|
| 2000 |
Cerrina F, Bollepalli S, Khan M, Solak H, Li W, He D. Image formation in EUV lithography: multilayer and resist properties Microelectronic Engineering. 53: 13-20. DOI: 10.1016/S0167-9317(00)00260-4 |
0.341 |
|
| 1999 |
Singh-Gasson S, Green RD, Yue Y, Nelson C, Blattner F, Sussman MR, Cerrina F. Maskless fabrication of light-directed oligonucleotide microarrays using a digital micromirror array. Nature Biotechnology. 17: 974-8. PMID 10504697 DOI: 10.1038/13664 |
0.37 |
|
| 1999 |
Khan M, Han G, Bollepalli SB, Cerrina F, Maldonado J. Extension of x-ray lithography to 50 nm with a harder spectrum Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3426. DOI: 10.1116/1.591024 |
0.783 |
|
| 1999 |
Lu B, Taylor JW, Cerrina F, Soo CP, Bourdillon AJ. Study of acid diffusion in a positive tone chemically amplified resist using an on-wafer imaging technique Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 3345. DOI: 10.1116/1.591009 |
0.35 |
|
| 1999 |
Bollepalli SB, Khan M, Cerrina F. Image formation in extreme ultraviolet lithography and numerical aperture effects Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 2992. DOI: 10.1116/1.590941 |
0.363 |
|
| 1999 |
Yun W, Lai B, Krasnoperova AA, Fabrizio ED, Cai Z, Cerrina F, Chen Z, Gentili M, Gluskin E. Development of zone plates with a blazed profile for hard x-ray applications Review of Scientific Instruments. 70: 3537-3541. DOI: 10.1063/1.1149956 |
0.325 |
|
| 1999 |
Yun W, Lai B, Cai Z, Maser J, Legnini D, Gluskin E, Chen Z, Krasnoperova AA, Vladimirsky Y, Cerrina F, Fabrizio ED, Gentili M. Nanometer focusing of hard x rays by phase zone plates Review of Scientific Instruments. 70: 2238-2241. DOI: 10.1063/1.1149744 |
0.33 |
|
| 1999 |
Hwu Y, Tsai W, Lai B, Mancini D, Je J, Noh D, Youn H, Hwang C, Cerrina F, Swiech W, Bertolo M, Tromba G, Margaritondo G. Use of photoelectron microscopes as X-ray detectors for imaging and other applications Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 437: 516-520. DOI: 10.1016/S0168-9002(99)00757-3 |
0.324 |
|
| 1999 |
Simon K, Vladimirsky O, Vladimirsky Y, Cerrina F. Overlay budget analysis for the 100 nm device generation Microelectronic Engineering. 46: 457-460. DOI: 10.1016/S0167-9317(99)00039-8 |
0.356 |
|
| 1999 |
Bollepalli SB, Cerrina F. Computation of reflected images from EUV masks Microelectronic Engineering. 46: 443-447. DOI: 10.1016/S0167-9317(99)00032-5 |
0.316 |
|
| 1998 |
Lorusso GF, Solak H, Singh S, Batson PJ, Underwood JH, Cerrina F. Maximum at ALS: A Powerful Tool to Investigate Open Problems in Micro and Optoelectronics Mrs Proceedings. 524: 215. DOI: 10.1557/Proc-524-215 |
0.325 |
|
| 1998 |
Solak HH, Lorusso GF, Singh S, Cerrina F, Underwood JH, Batson P. In-Situ X-ray Photoemission Spectromicroscopy of Electromigration in Patterned Al-Cu Lines With Maximum Mrs Proceedings. 516. DOI: 10.1557/Proc-516-39 |
0.32 |
|
| 1998 |
Lorusso GF, Solak H, Cerrina F, Underwood JH, Batson PJ, Kim Y, Cho Y, Kisielowski C, Krueger J, Weber ER. X-Ray Photoemission Spectromicroscopy Of Gan And AIGan Mrs Proceedings. 512: 393. DOI: 10.1557/Proc-512-393 |
0.319 |
|
| 1998 |
Chen Z, Krasnoperov NL, Gearhart SS, Vladimirsky Y, Cerrina F. High-aspect-ratio x-ray lithography for magnetic head fabrication Proceedings of Spie. 3512: 169-172. DOI: 10.1117/12.324053 |
0.376 |
|
| 1998 |
Bollepalli BS, Khan M, Cerrina F. Imaging properties of the extreme ultraviolet mask Journal of Vacuum Science & Technology B. 16: 3444-3448. DOI: 10.1116/1.590475 |
0.317 |
|
| 1998 |
De Stasio G, Gilbert B, Perfetti L, Fauchoux O, Valiquer A, Nelson T, Capozi M, Baudat PA, Cerrina F, Chen Z, Perfetti P, Tonner BP, Margaritondo G. Soft-x-ray transmission photoelectron spectromicroscopy with the MEPHISTO system Review of Scientific Instruments. 69: 3106-3108. DOI: 10.1063/1.1149067 |
0.363 |
|
| 1998 |
Shamoun B, Sprague M, Bedford F, Engelstad R, Cerrina F. X-ray mask distortions during e-beam patterning Microelectronic Engineering. 41: 283-286. DOI: 10.1016/S0167-9317(98)00065-3 |
0.338 |
|
| 1998 |
Hector S, Pol V, Khan M, Bollepalli S, Cerrina F. Investigation of mask pattern proximity correction to reduce image shortening in X-ray lithography Microelectronic Engineering. 41: 271-274. DOI: 10.1016/S0167-9317(98)00062-8 |
0.402 |
|
| 1997 |
Fisher AH, Laudon MF, Engelstad RL, Lovell EG, Cerrina F. Pattern placement errors in mask membranes Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 15: 2249-2254. DOI: 10.1116/1.589623 |
0.32 |
|
| 1997 |
Bollepalli BS, Khan M, Cerrina F. Automatic mask generation in x-ray lithography Journal of Vacuum Science & Technology B. 15: 2238-2242. DOI: 10.1116/1.589621 |
0.368 |
|
| 1997 |
Laudon M, Fisher A, Engelstad R, Cerrina F, Cummings K, Dauksher W, Resnick D, Johnson W, Puisto D. Prediction of in-plane distortions due to mask fabrication processes Microelectronic Engineering. 35: 549-552. DOI: 10.1016/S0167-9317(96)00154-2 |
0.302 |
|
| 1996 |
Welnak JT, Solak H, Wallace J, Cerrina F, Barbo F, Bertolo M, Bianco A, Fonzo SD, Fontana S, Jark W, Mazzolini F, Rosei R, Savoia A, Underwood JH, Margaritondo G. A new scanning photoemission microscope for ELETTRA: SuperMAXIMUM Review of Scientific Instruments. 67: 3358-3358. DOI: 10.1063/1.1147500 |
0.327 |
|
| 1996 |
Cerrina F. Preparation of microfocusing optics using synchrotron radiation sources (invited, abstract) Review of Scientific Instruments. 67: 3357-3357. DOI: 10.1063/1.1147380 |
0.339 |
|
| 1995 |
Cerrina F. The limits of patterning in X-ray lithography Mrs Proceedings. 380. DOI: 10.1557/Proc-380-173 |
0.374 |
|
| 1995 |
Ray‐Chaudhuri AK, Ng W, Cerrina F, Tan Z, Bjorkholm J, Tennant D, Spector SJ. Alignment of a multilayer‐coated imaging system using extreme ultraviolet Foucault and Ronchi interferometric testing Journal of Vacuum Science & Technology B. 13: 3089-3093. DOI: 10.1116/1.588328 |
0.325 |
|
| 1995 |
Tan Z, MacDowell AA, Fontaine BL, Bjorkholm JE, Tennant D, Taylor D, Himel M, Freeman RR, Waskiewicz WK, Windt DL, Spector S, Ray‐Chaudhuri AK, Stulen RH, Ng W, Cerrina F. At‐wavelength metrology of 13 nm lithography imaging optics Review of Scientific Instruments. 66: 2241-2243. DOI: 10.1063/1.1145718 |
0.366 |
|
| 1995 |
Lai B, Yun W, Xiao Y, Yang L, Legnini D, Cai Z, Krasnoperova A, Cerrina F, DiFabrizio E, Grella L, Gentili M. Development of a hard x‐ray imaging microscope Review of Scientific Instruments. 66: 2287-2289. DOI: 10.1063/1.1145666 |
0.358 |
|
| 1995 |
Welnak J, Dong Z, Solak H, Wallace J, Cerrina F, Bertolo M, Bianco A, Di Fonzo S, Fontana S, Jark W, Mazzolini F, Rosei R, Savoia A, Underwood JH, Margaritondo G. SuperMAXIMUM: A Schwarzschild-based, spectromicroscope for ELETTRA Review of Scientific Instruments. 66: 2273-2276. DOI: 10.1063/1.1145662 |
0.32 |
|
| 1994 |
Krasnoperova AA, Bell T, Rhyner S, Taylor JW, DePablo J, Cerrina F. Dissolution study of a novolak-based photoresist based on a developer diffusion model Japanese Journal of Applied Physics. 33: 701-706. DOI: 10.1143/Jjap.33.7012 |
0.311 |
|
| 1994 |
Wells GM, Anderson PD, Leonard QJ, Cerrina F, Waldo WG, Yamazaki K. Evaluation of a solid state detector for X-ray lithography dosimetry Japanese Journal of Applied Physics. 33: 690-697. DOI: 10.1143/Jjap.33.6905 |
0.342 |
|
| 1994 |
Reilly M, Leonard Q, Wells G, Capasso C, Anderson P, Taylor J, Waldo W, Yamazaki K, Chen G, Simon K, Cerrina F. Performance of the Modified Suss XRS 200/2M X-Ray Stepper at CXrL Japanese Journal of Applied Physics. 33: 6899-6904. DOI: 10.1143/Jjap.33.6899 |
0.321 |
|
| 1994 |
Chen G, Yamazaki K, Waldo W, Welnak J, Wells GM, Cerrina F. Synchrotron radiation x‐ray lithography beamline optics alignment using the Hartmann method Journal of Vacuum Science & Technology B. 12: 4013-4017. DOI: 10.1116/1.587421 |
0.303 |
|
| 1994 |
Fabrizio ED, Gentili M, Grella L, Baciocchi M, Krasnoperova A, Cerrina F, Yun W, Lai B, Gluskin E. High-performance multilevel blazed x-ray microscopy Fresnel zone plates: Fabricated using x-ray lithography Journal of Vacuum Science & Technology B. 12: 3979-3985. DOI: 10.1116/1.587414 |
0.372 |
|
| 1994 |
Gentili M, Fabrizio ED, Grella L, Baciocchi M, Mastrogiacomo L, Maggiora R, Xiao J, Cerrina F. Fabrication of controlled slope attenuated phase‐shift x‐ray masks for 250 nm synchrotron lithography Journal of Vacuum Science & Technology B. 12: 3954-3958. DOI: 10.1116/1.587409 |
0.402 |
|
| 1994 |
Wells GM, Brodsky EL, Reilly M, Taylor JW, Cerrina F. The center for X-ray lithography facility status and beamlines development Nuclear Inst. and Methods in Physics Research, A. 347: 466-471. DOI: 10.1016/0168-9002(94)91929-1 |
0.302 |
|
| 1994 |
Ng W, Ray-Chaudhuri AK, Liang S, Singh S, Solak H, Welnak J, Cerrina F, Margaritondo G, Underwood JH, Kortright JB, Perera RCC. High resolution spectromicroscopy with MAXIMUM: Photoemission spectroscopy reaches the 1000 Å scale Nuclear Inst. and Methods in Physics Research, A. 347: 422-430. DOI: 10.1016/0168-9002(94)91921-6 |
0.362 |
|
| 1994 |
Chen GJ, Cerrina F, Voss KF, Hyde Kim K, Brown FC. Ray-tracing of X-ray focusing capillaries Nuclear Inst. and Methods in Physics Research, A. 347: 407-411. DOI: 10.1016/0168-9002(94)91918-6 |
0.318 |
|
| 1994 |
Welnak J, Ray-Chaudhuri AK, Ng W, Cerrina F. Double-moment Kirkpatrick-Baez condensing mirrors: In situ alignment Nuclear Inst. and Methods in Physics Research, A. 347: 372-375. DOI: 10.1016/0168-9002(94)91912-7 |
0.347 |
|
| 1994 |
Ray-Chaudhuri AK, Ng W, Liang S, Cerrina F. Soft X-ray Foucault test: A path to diffraction-limited imaging Nuclear Inst. and Methods in Physics Research, A. 347: 364-371. DOI: 10.1016/0168-9002(94)91911-9 |
0.335 |
|
| 1994 |
Welnak C, Chen GJ, Cerrina F. SHADOW: A synchrotron radiation and X-ray optics simulation tool Nuclear Inst. and Methods in Physics Research, A. 347: 344-347. DOI: 10.1016/0168-9002(94)91906-2 |
0.318 |
|
| 1994 |
Chen GJ, Guo JZY, Cerrina F. Applications of faceted mirrors to X-ray lithography beamlines Nuclear Inst. and Methods in Physics Research, A. 347: 238-243. DOI: 10.1016/0168-9002(94)91884-8 |
0.355 |
|
| 1994 |
Xiao J, Cerrina F. Design of an aspheric mirror for synchrotron radiation X-ray lithography beamline Nuclear Inst. and Methods in Physics Research, A. 347: 231-237. DOI: 10.1016/0168-9002(94)91883-X |
0.34 |
|
| 1994 |
Ray-Chaudhuri AK, Cerrina F. Status of soft X-ray photoemission microscopy utilizing synchrotron radiation Nuclear Inst. and Methods in Physics Research, B. 87: 104-111. DOI: 10.1016/0168-583X(94)95244-2 |
0.32 |
|
| 1993 |
Ray-Chaudhuri AK, Ng W, Liang S, Singh S, Solak H, Cerrina F. Characterization of Cleaved GaAs(110) with a Scanning Photoemission Microscope Capable of Submicron Resolution Mrs Proceedings. 307. DOI: 10.1557/Proc-307-255 |
0.335 |
|
| 1993 |
Chen G, Wallace JP, Cerrina F. Linear-Fresnel-Zone-Plate-Based Two-State Alignment Method For Sub-0.25 μM X-Ray Lithography System Japanese Journal of Applied Physics. 32: 5977-5981. DOI: 10.1143/Jjap.32.5977 |
0.33 |
|
| 1993 |
Laudon MF, Laird DL, Engelstad RL, Cerrina F. Mechanical Response Of X-Ray Masks Japanese Journal of Applied Physics. 32: 5928-5932. DOI: 10.1143/Jjap.32.5928 |
0.334 |
|
| 1993 |
Wells GM, Brodsky EL, Cerrina F, Waldo WG. Evaluation of beryllium foils for x‐ray lithography beamlines Journal of Vacuum Science & Technology B. 11: 3008-3011. DOI: 10.1116/1.586885 |
0.322 |
|
| 1993 |
Fabrizio ED, Grella L, Luciani L, Gentili M, Baciocchi M, Figliomeni M, Mastrogiacomo L, Maggiora R, Leonard Q, Cerrina F, Molino M, Powderly D. Metrology of high‐resolution resist structures on insulating substrates Journal of Vacuum Science & Technology B. 11: 2456-2462. DOI: 10.1116/1.586646 |
0.321 |
|
| 1993 |
Krasnoperova AA, Xiao J, Cerrina F, Fabrizio ED, Luciani L, Figliomeni M, Gentili M, Yun W, Lai B, Gluskin E. Fabrication of hard x‐ray phase zone plate by x‐ray lithography Journal of Vacuum Science & Technology B. 11: 2588-2591. DOI: 10.1116/1.586630 |
0.331 |
|
| 1993 |
Gentili M, Grella L, Fabrizio ED, Luciani L, Baciocchi M, Figliomeni M, Maggiora R, Mastrogiacomo L, Cerrina F. Development of an electron‐beam process for the fabrication of x‐ray nanomasks Journal of Vacuum Science & Technology B. 11: 2938-2942. DOI: 10.1116/1.586564 |
0.367 |
|
| 1993 |
Ray-Chaudhuri AK, Margaritondo G, Underwood JH, Ng W, Kortright JB, Singh S, Perera RC, Welnak JT, Wallace JP, Capasso C, Cerrina F. First Results of Microspectroscopy from a Scanning Photoemission Microscope with a Submicron Probe Size Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 11: 2324-2329. DOI: 10.1116/1.578370 |
0.362 |
|
| 1993 |
Capasso C, Ng W, Ray-Chaudhuri AK, Liang SH, Cole RK, Guo ZY, Wallace J, Cerrina F, Underwood J, Perera R, Kortright J, Stasio GD, Margaritondo G. Scanning photoemission microscopy on MAXIMUM reaches 0.1 micron resolution Surface Science. 287: 1046-1050. DOI: 10.1016/0039-6028(93)91124-8 |
0.332 |
|
| 1992 |
Chen G, Wallace J, Nachman R, Wells G, Bodoh D, Anderson P, Reilly M, Cerrina F. CXrL aligner: An experimental x‐ray lithography system for quarter‐micron feature devices Journal of Vacuum Science & Technology B. 10: 3229-3234. DOI: 10.1116/1.585919 |
0.307 |
|
| 1992 |
Welnak C, Anderson P, Khan M, Singh S, Cerrina F. Recent developments in SHADOW Review of Scientific Instruments. 63: 865-868. DOI: 10.1063/1.1142630 |
0.31 |
|
| 1992 |
Lai B, Yun WB, Legnini D, Xiao Y, Chrzas J, Viccaro PJ, White V, Bajikar S, Denton D, Cerrina F, Di Fabrizio E, Gentili M, Grella L, Baciocchi M. Hard x‐ray phase zone plate fabricated by lithographic techniques Applied Physics Letters. 61: 1877-1879. DOI: 10.1063/1.108400 |
0.332 |
|
| 1992 |
Wallace J, Chen G, Reilly M, Anderson P, Cerrina F. A novel aligner for X-ray lithography Nuclear Inst. and Methods in Physics Research, A. 319: 371-375. DOI: 10.1016/0168-9002(92)90580-W |
0.348 |
|
| 1992 |
Gentili M, Grella L, Baciocchi M, Kumar R, Meneghini G, Plumb D, Leonard Q, Cerrina F. Fabrication of DFB laser gratings using synchrotron radiation proximity lithography Microelectronic Engineering. 17: 551-554. DOI: 10.1016/0167-9317(92)90113-6 |
0.408 |
|
| 1992 |
Prewett PD, Gentili M, Maggiora R, Mastrogiacomo L, Watson JG, Turner GS, Brown GW, Plumb D, Leonard Q, Cerrina F. FIB repair of clear and opaque defects in x-ray masks Microelectronic Engineering. 17: 249-253. DOI: 10.1016/0167-9317(92)90050-2 |
0.319 |
|
| 1992 |
Laird DL, Lenius PE, Engelstad RL, Cerrina F. Analysis and optimization of x-ray masks using finite element methods Microelectronic Engineering. 17: 209-213. DOI: 10.1016/0167-9317(92)90043-Q |
0.302 |
|
| 1992 |
Cerrina F, Guo JZY, Turner S, Ocola L, Khan M, Anderson P. Image formation in x-ray lithography: Process optimization Microelectronic Engineering. 17: 135-139. DOI: 10.1016/0167-9317(92)90027-O |
0.304 |
|
| 1991 |
Wells CMM, Pearson DW, De Luca PM, Wells GM, Cerrina F, Kennan WS, Gould MN. Synchrotron-produced ultrasoft x-rays: A tool for testing biophysical models of radiation action International Journal of Radiation Biology. 59: 985-996. PMID 1674282 DOI: 10.1080/09553009114550871 |
0.326 |
|
| 1991 |
Capasso C, Ray-Chaudhuri AK, Ng W, Liang S, Cole RK, Wallace J, Cerrina F, Underwood JH, Kortright JB, Perera RCC. High-resolution x-ray microscopy using an undulator source, photoelectron studies with MAXIMUM Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 9: 1248-1253. DOI: 10.1116/1.577607 |
0.379 |
|
| 1991 |
Cole RK, Cerrina F. Novel beamline optics for x-ray lithography Microelectronic Engineering. 13: 295-298. DOI: 10.1016/0167-9317(91)90097-W |
0.371 |
|
| 1990 |
White V, Wallace J, Cerrina F, Vladimirski Y, Su Y, Maldonado J. Contrast amplification of very high resolution x-ray masks Journal of Vacuum Science & Technology B. 8: 1595-1599. DOI: 10.1116/1.585122 |
0.38 |
|
| 1990 |
Guo JZY, Chen G, White V, Anderson P, Cerrina F. Aerial image formation in synchrotron‐radiation‐based x‐ray lithography: The whole picture Journal of Vacuum Science & Technology B. 8: 1551-1556. DOI: 10.1116/1.585114 |
0.341 |
|
| 1990 |
Blackwell RJ, Baker JW, Wells GM, Hansen M, Wallace J, Cerrina F. Synchrotron radiation x‐ray lithography fabrication of 0.35 μm gate‐length n‐type metal–oxide–semiconductor transistors Journal of Vacuum Science & Technology B. 8: 439-445. DOI: 10.1116/1.585041 |
0.328 |
|
| 1990 |
Ng W, Ray‐Chaudhuri AK, Crossley S, Crossley D, Gong C, Guo J, Hansen R, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J. The photoemission spectromicroscope multiple‐application x‐ray imaging undulator microscope (maximum) Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 8: 2563-2565. DOI: 10.1116/1.576736 |
0.355 |
|
| 1990 |
De Stasio G, Ng W, Ray-Chaudhuri A, Cole R, Guo Z, Wallace J, Margaritondo G, Cerrina F, Underwood J, Perera R, Kortright J, Mercanti D, Ciotti M. Scanning photoelectron microscopy with undulator radiation: A successful test on uncoated neurons Nuclear Instruments and Methods in Physics Research Section a: Accelerators, Spectrometers, Detectors and Associated Equipment. 294: 351-354. DOI: 10.1016/0168-9002(90)91851-2 |
0.316 |
|
| 1990 |
Margaritondo G, Cerrina F. Overview of soft-x-ray photoemission spectromicroscopy Nuclear Inst. and Methods in Physics Research, A. 291: 26-35. DOI: 10.1016/0168-9002(90)90028-5 |
0.319 |
|
| 1990 |
Vladimirsky Y, Maldonado JR, Vladimirsky O, Cerrina F, Hansen M, Nachman R, Wells GM. Thermoelastic effects in x-ray lithography masks during synchrotron storage ring irradiation Microelectronic Engineering. 11: 287-293. DOI: 10.1016/0167-9317(90)90117-C |
0.347 |
|
| 1989 |
Smith A, Riedel C, Edwards B, Savage D, Lai B, Ray‐Chaudhuri A, Cerrina F, Lagally MG, Underwood J, Falco C. A simple monochromator based on x‐ray multilayer mirrors Review of Scientific Instruments. 60: 2003-2005. DOI: 10.1063/1.1140860 |
0.314 |
|
| 1989 |
Chapman K, Lai B, Cerrina F, Viccaro J. Modeling of undulator sources (abstract) Review of Scientific Instruments. 60: 2127-2127. DOI: 10.1063/1.1140846 |
0.301 |
|
| 1989 |
Meger CM, Pearson DW, DeLuca PM, Wells GM, Cerrina F, Gould MN. Beamline and irradiation chamber for dosimetry and biology studies using synchrotron radiation Review of Scientific Instruments. 60: 2235-2238. DOI: 10.1063/1.1140778 |
0.341 |
|
| 1989 |
Chapman K, Lai B, Cerrina F, Viccaro J. Modelling of undulator sources Nuclear Inst. and Methods in Physics Research, A. 283: 88-99. DOI: 10.1016/0168-9002(89)91260-6 |
0.312 |
|
| 1989 |
Lai B, Nachman R, Ray-Chaudhuri AK, Cerrina F. X-ray assisted nitridation of silicon surface at ambient temperature Solid State Communications. 71: 721-725. DOI: 10.1016/0038-1098(89)90073-2 |
0.301 |
|
| 1988 |
Wells GM, Chen G, So D, Brodsky EL, Kriesel K, Cerrina F, Karnezos M. Quantitative in situ characterization of x‐ray mask distortions Journal of Vacuum Science & Technology B. 6: 2190-2195. DOI: 10.1116/1.584080 |
0.325 |
|
| 1988 |
Visser CCG, Uglow JE, Burns DW, Wells G, Redaelli R, Cerrina F, Guckel H. The development of a silicon nitride mask technology for synchrotron radiation X-ray lithography Nuclear Inst. and Methods in Physics Research, A. 266: 686-690. DOI: 10.1016/0168-9002(88)90466-4 |
0.343 |
|
| 1988 |
Meger CM, Pearson DW, Deluca PM, Wells GM, Redaelli R, Cerrina F. A comparison of three detectors for soft X-ray dosimetry Nuclear Inst. and Methods in Physics Research, A. 266: 608-611. DOI: 10.1016/0168-9002(88)90453-6 |
0.331 |
|
| 1988 |
Boudry J, Riedel C, Edwards B, Lagally M, Redaelli R, Cerrina F, Falco C, Fernandez F, Underwood JH, Hettrick M. A beamline for layered synthetic microstructure studies Nuclear Inst. and Methods in Physics Research, A. 266: 351-355. DOI: 10.1016/0168-9002(88)90409-3 |
0.321 |
|
| 1988 |
Cerrina F, Margaritondo G, Underwood JH, Hettrick M, Green MA, Brillson LJ, Franciosi A, Höchst H, Deluca PM, Gould MN. Maximum: A scanning photoelectron microscope at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 303-307. DOI: 10.1016/0168-9002(88)90401-9 |
0.404 |
|
| 1988 |
Wells GM, Lai B, So D, Redaelli R, Cerrina F. X-ray lithography beamlines at Aladdin Nuclear Inst. and Methods in Physics Research, A. 266: 278-286. DOI: 10.1016/0168-9002(88)90397-X |
0.349 |
|
| 1987 |
Redaelli R, Wells GM, Cerrina F, Crapella S, Vento G. Evaluation of x-ray resists for submicron lithography Microelectronic Engineering. 6: 519-525. DOI: 10.1016/0167-9317(87)90082-7 |
0.343 |
|
| 1986 |
Lai B, Mitchell G, Wells GM, Cerrina F. The University of Wisconsin X-ray lithography beamline: First results Nuclear Inst. and Methods in Physics Research, A. 246: 681-686. DOI: 10.1016/0168-9002(86)90173-7 |
0.326 |
|
| 1986 |
Lai B, Cerrina F, Pouey M. A new undulator grazing incidence monochromator Nuclear Inst. and Methods in Physics Research, A. 246: 297-302. DOI: 10.1016/0168-9002(86)90095-1 |
0.306 |
|
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