Yoshio Nishi

Electrical Engineering Stanford University, Palo Alto, CA 
"Yoshio Nishi"


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Andy K. Chao grad student 2007 Stanford
Hemanth Jagannathan grad student 2007 Stanford
Jungyup Kim grad student 2007 Stanford
Ching-Huang Lu grad student 2007 Stanford
Hiroyuki Sanda grad student 2007 Stanford
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Mleczko MJ, Yu AC, Smyth CM, et al. (2019) Contact Engineering High Performance -Type MoTe Transistors. Nano Letters
Choudhury FA, Nguyen HM, King SW, et al. (2018) Measurement of the vacuum-ultraviolet absorption spectrum of low-k dielectrics using X-ray reflectivity Applied Physics Letters. 112: 82902
Guo X, Pei D, Zheng H, et al. (2017) Extrinsic time-dependent dielectric breakdown of low-k organosilicate thin films from vacuum-ultraviolet irradiation Journal of Vacuum Science and Technology. 35: 21509
Lee TH, Kim K, Kim G, et al. (2017) Chemical Vapor-Deposited Hexagonal Boron Nitride as a Scalable Template for High-Performance Organic Field-Effect Transistors Chemistry of Materials. 29: 2341-2347
Mleczko MJ, Xu RL, Okabe K, et al. (2016) High Current Density and Low Thermal Conductivity of Atomically Thin Semimetallic WTe2. Acs Nano
Cho SH, Chung KW, Kim JO, et al. (2016) Association of miR-146aC>G, miR-149C>T, miR-196a2T>C, and miR-499A>G polymorphisms with risk of recurrent implantation failure in Korean women. European Journal of Obstetrics, Gynecology, and Reproductive Biology. 202: 14-19
Duncan D, Magyari-Köpe B, Nishi Y. (2016) Filament-induced anisotropic oxygen vacancy diffusion and charge trapping effects in hafnium oxide RRAM Ieee Electron Device Letters. 37: 400-403
Han JW, Louie B, Berger N, et al. (2016) A novel Bi-stable 1-transistor SRAM for high density embedded applications Technical Digest - International Electron Devices Meeting, Iedm. 2016: 26.7.1-26.7.4
Mleczko MJ, Zhang C, Lee HR, et al. (2016) Atomically-thin HfSe2 transistors with native metal oxides Device Research Conference - Conference Digest, Drc. 2016
Pei D, Xue P, Li W, et al. (2016) The effect of vacuum ultraviolet irradiation on the time-dependent dielectric breakdown of organosilicate dielectrics Applied Physics Letters. 109
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