Ebo H. Croffie, Ph.D.
Affiliations: | 2001 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesGoogle:
"Ebo Croffie"Parents
Sign in to add mentor| Andrew R. Neureuther | grad student | 2001 | UC Berkeley | |
| (Simulation tools for optical resist models (STORM).) | ||||
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Fan Y, Zavyalova L, Zhang Y, et al. (2009) Resist development modeling for OPC accuracy improvement Proceedings of Spie - the International Society For Optical Engineering. 7274 |
| Pathak P, Yan Q, Schmoeller T, et al. (2009) Building bulk-resist model for image formation in chemically amplified resists at EUV Microelectronic Engineering. 86: 787-791 |
| Cheng M, Yuan L, Croffie E, et al. (2002) Improving resist resolution and sensitivity via electric-field enhanced postexposure baking Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 734-740 |
| Croffie E, Yuan L, Cheng M, et al. (2001) Survey of chemically amplified resist models and simulator algorithms Proceedings of Spie - the International Society For Optical Engineering. 4345: 983-991 |
| Lee SI, Ng KC, Orimoto T, et al. (2001) LAVA web-based remote simulation: Enhancements for education and technology innovation Proceedings of Spie - the International Society For Optical Engineering. 4346: 1500-1506 |
| Cheng M, Tyminski J, Croffie E, et al. (2000) Modeling anomalous depth dependent dissolution effects in chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 1294-1298 |
| Cheng M, Croffie E, Yuan L, et al. (2000) Enhancement of resist resolution and sensitivity via applied electric field Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3318-3322 |
| Croffie E, Yuan L, Cheng M, et al. (2000) Modeling influence of structural changes in photoacid generators on 193 nm single layer resist imaging Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 3340-3344 |
| Croffie E, Cheng M, Neureuther A, et al. (2000) Overview of the STORM program application to 193nm single layer resists Microelectronic Engineering. 53: 437-442 |
| Croffie E, Cheng M, Neureuther A. (1999) Moving boundary transport model for acid diffusion in chemically amplified resists Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 17: 3339-3344 |