Thomas V. Pistor, Ph.D.
Affiliations: | 2001 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesGoogle:
"Thomas Pistor"Parents
Sign in to add mentor| Andrew R. Neureuther | grad student | 2001 | UC Berkeley | |
| (Electromagnetic simulation and modeling with applications in lithography.) | ||||
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Publications
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| Sherwin S, Pistor TV, Neureuther A, et al. (2017) Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask Proceedings of Spie. 10143: 1014317 |
| Upadhyaya M, Basavalingappa A, Herbol H, et al. (2015) Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33 |
| Deng Y, Pistor T, Neureuther AR. (2002) Effects of multilayer mask roughness on extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 344-349 |
| Neureuther A, Adam K, Hotta S, et al. (2001) Simulation of image quality issues at low k1 for 100nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4409: 33-40 |
| Deng Y, Pistor T, Neureuther AR. (2001) Models for characterizing the printability of buried EUV defects Proceedings of Spie - the International Society For Optical Engineering. 4343: 551-558 |
| Deng Y, Pistor T, Neureuther AR. (2001) Rigorous electromagnetic simulation applied to alignment systems Proceedings of Spie - the International Society For Optical Engineering. 4346: 1533-1540 |
| Lee SI, Ng KC, Orimoto T, et al. (2001) LAVA web-based remote simulation: Enhancements for education and technology innovation Proceedings of Spie - the International Society For Optical Engineering. 4346: 1500-1506 |
| Pistor TV. (2001) Accuracy issues in the finite difference time domain simulation of photomask scattering Proceedings of Spie - the International Society For Optical Engineering. 4346: 1484-1491 |
| Hotta S, Pistor TV, Adams K, et al. (2001) Effects of shifter edge topography on through focus performance Proceedings of Spie - the International Society For Optical Engineering. 4186: 827-837 |
| Pistor T, Deng Y, Neureuther A. (2000) Extreme ultraviolet mask defect simulation: Low-profile defects Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2926-2929 |