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Garth C. Robins, Ph.D.

Affiliations: 
2005 University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices
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Andrew R. Neureuther grad student 2005 UC Berkeley
 (Interferometric pattern and probe-based aberration monitors.)

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Publications

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Robins GC, Neureuther AR. (2005) Are pattern and probe aberration monitors ready for prime time? Proceedings of Spie - the International Society For Optical Engineering. 5754: 1704-1715
Robins GC, Neureuther AR. (2004) Characterizing the demons in high-NA phase-shifting masks Proceedings of Spie - the International Society For Optical Engineering. 5567: 445-455
Neureuther AR, McIntyre G, Gennari F, et al. (2004) Feature level test patterns for characterizing residual process effects Proceedings of Spie - the International Society For Optical Engineering. 5379: 76-84
Robins GC, Neureuther AR, Dusa M, et al. (2004) Interferometric-probe aberration monitor performance in the production environment Proceedings of Spie - the International Society For Optical Engineering. 5377: 1971-1982
Robins GC, Dusa M, Geh B, et al. (2004) Interferometric-probe aberration monitors: Aerial image and in-resist performance Proceedings of Spie - the International Society For Optical Engineering. 5446: xxv-xxxviii
Robins GC, Dusa M, Geh B, et al. (2004) Interferometric-probe aberration monitors: Aerial image and in-resist performance Proceedings of Spie - the International Society For Optical Engineering. 5446: xxv-xxxviii
Robins GC, Neureuther AR. (2003) Experimental assessment of pattern and probe-based aberration monitors Proceedings of Spie - the International Society For Optical Engineering. 5040: 1420-1431
Robins G, Neureuther A. (2003) Pattern and probe-based aberration monitors for the human eye Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 2922-2925
Gennari FE, Robins G, Neureuther AR. (2002) Validation of the aberration pattern-matching OPC strategy Proceedings of Spie - the International Society For Optical Engineering. 4692: 444-453
Robins GC, Neureuther AR. (2002) Illumination, mask and tool effects on pattern and probe-based aberration monitors Proceedings of Spie - the International Society For Optical Engineering. 4691: 138-147
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