Gregory R. McIntyre, Ph.D.
Affiliations: | 2006 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Integrated Circuits (INC); Solid-State DevicesGoogle:
"Gregory McIntyre"Parents
Sign in to add mentor| Andrew R. Neureuther | grad student | 2006 | UC Berkeley | |
| (Characterizing polarized illumination in high numerical aperture optical lithography with phase shifting masks.) | ||||
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Publications
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| McIntyre GR, Kye J, Levinson H, et al. (2006) Polarization aberrations in hyper-numerical-aperture projection printing: A comparison of various representations Journal of Microlithography, Microfabrication and Microsystems. 5 |
| McIntyre GR, Neureuther A. (2006) Phase shift mask interferometric birefringence monitor Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 2808-2814 |
| McIntyre G, Robbins G, Neureuther A. (2005) Phase shifting mask as a precision instrument for characterizing image-forming optical systems Proceedings of Spie - the International Society For Optical Engineering. 5878: 1-10 |
| McIntyre GR, Neureuther AR. (2005) Phase-shifting mask polarimetry: Monitoring polarization at 193-nm high numerical aperture and immersion lithography with phase shifting masks Journal of Microlithography, Microfabrication and Microsystems. 4 |
| McIntyre GR, Holwill J, Neureuther A, et al. (2005) Screening layouts for high-numerical aperture and polarization effects using pattern matching Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 23: 2646-2652 |