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Marshal Miller, Ph.D.

Affiliations: 
2010 Electrical Engineering University of California, Berkeley, Berkeley, CA, United States 
Area:
Integrated Circuits (INC); Solid-State Devices
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Andrew R. Neureuther grad student 2010 UC Berkeley
 (Mask Edge Effects in Optical Lithography and Chip Level Modeling Methods.)

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Publications

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Neureuther AR, Rubinstein J, Chin E, et al. (2010) Modeling optical lithography physics Japanese Journal of Applied Physics. 49: 06GA011-06GA017
Neureuther A, Poppe W, Holwill J, et al. (2007) Collaborative platform, tool-kit, and physical models for DfM Proceedings of Spie - the International Society For Optical Engineering. 6521
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