Jason P. Cain, Ph.D.
Affiliations: | 2004 | University of California, Berkeley, Berkeley, CA, United States |
Area:
Energy (ENE); Integrated Circuits (INC); Physical Electronics (PHY); Semiconductor manufacturing; Solid-State DevicesGoogle:
"Jason Cain"Parents
Sign in to add mentor| Costas J. Spanos | grad student | 2004 | UC Berkeley | |
| (Characterization of the critical dimension error budget for extreme ultraviolet lithography.) | ||||
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Publications
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| Cain JP, Fakhry M, Pathak P, et al. (2017) Pattern-based analytics to estimate and track yield risk of designs down to 7nm Proceedings of Spie. 10148: 1014805 |
| Cain JP, Lai Y, Gennari F, et al. (2016) Methodology for analyzing and quantifying design style changes and complexity using topological patterns Proceedings of Spie. 9781: 978108 |
| Fakhry M, Madkour K, ElManhawy W, et al. (2016) Pattern-based DTCO flow for early estimation of lithographic difficulty using optical image processing Proceedings of Spie. 9781 |
| Cain JP, Rodriguez NP, Sweis J, et al. (2014) A pattern-driven design regularization methodology Proceedings of Spie - the International Society For Optical Engineering. 9053 |
| Ma Y, Sweis J, Bencher C, et al. (2010) Decomposition strategies for self-aligned double patterning Proceedings of Spie - the International Society For Optical Engineering. 7641 |
| Kim RH, McLellan E, Yin Y, et al. (2010) Spacer defined double patterning for sub-72 nm pitch logic technology Proceedings of Spie - the International Society For Optical Engineering. 7640 |
| Cain JP, Capodieci L. (2009) Computational technology scaling from 32 nm to 28 and 22 nm through systematic layout printability verification Proceedings of Spie - the International Society For Optical Engineering. 7275 |
| Cain JP, Threefoot M, Shah K, et al. (2008) Automated creation of production metrology recipes based on design information Proceedings of Spie - the International Society For Optical Engineering. 6922 |
| Bunday B, Lipscomb P, Allgair J, et al. (2007) Realizing "value-added" metrology Proceedings of Spie - the International Society For Optical Engineering. 6518 |
| Lensing K, Cain J, Prabhu A, et al. (2007) Lithography process control using scatterometry metrology and semi-physical modeling Proceedings of Spie - the International Society For Optical Engineering. 6518 |