Lucas B. Henderson, Ph.D.
Affiliations: | 2009 | Chemical Engineering | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
Materials Science Engineering, Electronics and Electrical EngineeringGoogle:
"Lucas Henderson"Parents
Sign in to add mentor| John G. Ekerdt | grad student | 2009 | UT Austin | |
| (Deposition and properties of cobalt- and ruthenium-based ultra-thin films.) | ||||
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Publications
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| Henderson LB, Ekerdt JG. (2010) Effect of phosphorus and carbon incorporation in amorphous cobalt films prepared by chemical vapor deposition Journal of the Electrochemical Society. 157 |
| Henderson LB, Rivers JH, Bost DE, et al. (2010) Nanocrystalline cobalt-based films with high thermal stability from a single molecule Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 28: 54-60 |
| Henderson LB, Ekerdt JG. (2010) Chemically capping copper with cobalt Microelectronic Engineering. 87: 588-592 |
| Henderson LB, Ekerdt JG. (2009) Chemical vapor deposition of amorphous cobalt-phosphorus alloy films Electrochemical and Solid-State Letters. 12 |
| Henderson LB, Ekerdt JG. (2009) Time-to-failure analysis of 5 nm amorphous Ru(P) as a copper diffusion barrier Thin Solid Films. 517: 1645-1649 |
| Ekerdt JG, Shin J, Kim H, et al. (2008) Chemical vapor deposition of amorphous ruthenium-phosphorus alloy films for Cu interconnect applications Advanced Metallization Conference (Amc). 179-185 |