Tejinder Singh, Ph.D.
Affiliations: | 2010 | Chemical Engineering | University of Massachusetts, Amherst, Amherst, MA |
Area:
Chemical Engineering, NanotechnologyGoogle:
"Tejinder Singh"Parents
Sign in to add mentor| Dimitrios Maroudas | grad student | 2010 | U Mass Amherst | |
| (Atomic-scale modeling of transition-metal doping of semiconductor nanocrystals.) | ||||
| Triantafillos J. Mountziaris | grad student | 2010 | U Mass Amherst | |
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Publications
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| Singh T, Mountziaris TJ, Maroudas D. (2012) First-principles theoretical analysis of transition-metal doping of ZnSe quantum dots Journal of Applied Physics. 112 |
| Singh T, Mountziaris TJ, Maroudas D. (2012) Transition-metal doping of small cadmium selenide clusters Applied Physics Letters. 100 |
| Singh T, Mountziaris TJ, Maroudas D. (2010) On the transition-metal doping efficiency of zinc oxide nanocrystals Applied Physics Letters. 97 |
| Pandey SC, Singh T, Maroudas D. (2009) Kinetic Monte Carlo simulations of surface growth during plasma deposition of silicon thin films. The Journal of Chemical Physics. 131: 034503 |
| Muniz AR, Singh T, Aydil ES, et al. (2009) Analysis of diamond nanocrystal formation from multiwalled carbon nanotubes Physical Review B - Condensed Matter and Materials Physics. 80 |
| Muniz AR, Singh T, Maroudas D. (2009) Effects of hydrogen chemisorption on the structure and deformation of single-walled carbon nanotubes Applied Physics Letters. 94 |
| Singh T, Behr MJ, Aydil ES, et al. (2009) First-principles theoretical analysis of pure and hydrogenated crystalline carbon phases and nanostructures Chemical Physics Letters. 474: 168-174 |
| Pandey SC, Singh T, Maroudas D. (2008) On the growth mechanism of plasma deposited amorphous silicon thin films Applied Physics Letters. 93 |
| Singh T, Mountziaris TJ, Maroudas D. (2008) First-principles theoretical analysis of dopant adsorption and diffusion on surfaces of ZnSe nanocrystals Chemical Physics Letters. 462: 265-268 |
| Singh T, Valipa MS, Mountziaris TJ, et al. (2007) Mechanisms and energetics of hydride dissociation reactions on surfaces of plasma-deposited silicon thin films. The Journal of Chemical Physics. 127: 194703 |