Richard P. Good, Ph.D.
Affiliations: | 2004 | University of Texas at Austin, Austin, Texas, U.S.A. |
Area:
Chemical EngineeringGoogle:
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Publications
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Good R, Qin SJ. (2011) Performance Synthesis of Multiple Input−Multiple Output (MIMO) Exponentially Weighted Moving Average (EWMA) Run-to-Run Controllers with Metrology Delay Industrial & Engineering Chemistry Research. 50: 1400-1409 |
Good RP, Pabst D, Stirton JB. (2010) Compensating for the initialization and sampling of EWMA run-to-run controlled processes Ieee Transactions On Semiconductor Manufacturing. 23: 168-177 |
Good RP, Kost D, Cherry GA. (2010) Introducing a unified PCA algorithm for model size reduction Ieee Transactions On Semiconductor Manufacturing. 23: 201-209 |
Lensing K, Cain J, Prabhu A, et al. (2007) Lithography process control using scatterometry metrology and semi-physical modeling Proceedings of Spie - the International Society For Optical Engineering. 6518 |
Holfeld A, Barlović R, Good RP. (2007) A fab-wide APC sampling application Ieee Transactions On Semiconductor Manufacturing. 20: 393-399 |
Qin SJ, Cherry G, Good R, et al. (2006) Semiconductor manufacturing process control and monitoring: A fab-wide framework Journal of Process Control. 16: 179-191 |
Qin SJ, Cherry G, Good R, et al. (2004) Control and Monitoring of Semiconductor Manufacturing Processes: Challenges and Opportunities Ifac Proceedings Volumes. 37: 125-136 |