Brian P. Osborn, Ph.D.

2004 University of Texas at Austin, Austin, Texas, U.S.A. 
Organic Chemistry
"Brian Osborn"


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C. Grant Willson grad student 2004 UT Austin (Chemistry Tree)
 (Vacuum ultraviolet directed design, synthesis and development of 157 nm photoresist materials.)
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Grayson SM, Long BK, Kusomoto S, et al. (2006) Synthesis and characterization of norbornanediol isomers and their fluorinated analogues. The Journal of Organic Chemistry. 71: 341-4
Chambers CR, Kusumoto S, Osborn BP, et al. (2004) Design of dissolution inhibitors for chemically amplified photolithographic systems Proceedings of Spie - the International Society For Optical Engineering. 5376: 360-368
Chambers CR, Kusumoto S, Lee GS, et al. (2003) Dissolution inhibitors for 157 nm photolithography Proceedings of Spie - the International Society For Optical Engineering. 5039: 93-102
Trinque BC, Chambers CR, Osborn BP, et al. (2003) Vacuum-UV influenced design of polymers and dissolution inhibitors for next generation photolithography Journal of Fluorine Chemistry. 122: 17-26
Trinque BC, Osborn BP, Chambers CR, et al. (2002) Advances in resists for 157 nm microlithography Proceedings of Spie - the International Society For Optical Engineering. 4690: 58-68
Tran HV, Hung RJ, Chiba T, et al. (2002) Metal-catalyzed vinyl addition polymers for 157 nm resist applications. 2. Fluorinated norbornenes: Synthesis, polymerization, and initial imaging results Macromolecules. 35: 6539-6549
Grant Willson C, Trinque BC, Osborn BP, et al. (2002) The design of resist materials for 157nm lithography Journal of Photopolymer Science and Technology. 15: 583-590
Willson CG, McAdams CL, Yueh W, et al. (2000) Synthesis of comb poly(4-hydroxystyrene) using conventional and `living' free-radical polymerization American Chemical Society, Polymer Preprints, Division of Polymer Chemistry. 41: 946-947
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