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Kejing Li, Ph.D.

Affiliations: 
2010 Chemical & Biological Engineering The University of Alabama, Tuscaloosa, AL 
Area:
Chemical Engineering
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"Kejing Li"
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Tonya M. Klein grad student 2010 University of Alabama
 (Hafnium alkylamides and alkoxide adsorption and reaction on hydrogen terminated silicon surfaces in a flow reactor.)

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Publications

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Xiong J, Fang B, Lu Y, et al. (2018) Rheology and high-temperature stability of novel viscoelastic gemini micelle solutions Journal of Dispersion Science and Technology. 39: 1324-1327
Liu S, Zhang H, Qiu X, et al. (2018) Rheokinetic study of gel-breaking process of xanthan gum solution Journal of Dispersion Science and Technology. 39: 270-274
Li G, Fang B, Lu Y, et al. (2016) Rheological Properties and Crosslinking Rheo-Kinetics of CMHEC/CTAB Synergistic Systems Journal of Dispersion Science and Technology. 37: 1826-1831
Ma M, Fang B, Lu Y, et al. (2016) Intrinsic Rheo-Kinetics on Gelation Process of Hydrophobic Amphoteric Cellulose Journal of Dispersion Science and Technology. 37: 1076-1082
Chen J, Fang B, Jin H, et al. (2016) Photorheologically reversible micelle composed of polymerizable cationic surfactant and 4-phenylazo benzoic acid Chinese Journal of Chemical Engineering. 24: 289-292
Li K, Akeredolu BA, Renehan AM, et al. (2013) Correlation of chemical and physical properties of an Alaska heavy oil from the Ugnu formation Fuel. 103: 843-849
Li K, Zhang L, Dixon DA, et al. (2011) Undulating topography of HfO 2 thin films deposited in a mesoscale reactor using hafnium (IV) tert butoxide Aiche Journal. 57: 2989-2996
Li K, Li S, Li N, et al. (2010) Tetrakis(dimethylamido)hafnium adsorption and reaction on hydrogen terminated Si(100) surfaces Journal of Physical Chemistry C. 114: 14061-14075
Platt CL, Li N, Li K, et al. (2010) Atomic layer deposition of HfO2: Growth initiation study on metallic underlayers Thin Solid Films. 518: 4081-4086
Li K, Dubey S, Bhandari HB, et al. (2007) In situ attenuated total reflectance Fourier transform infrared spectroscopy of hafnium (IV) tert butoxide adsorption onto hydrogen terminated Si (100) and Si (111) Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 25: 1389-1394
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