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Aron Cepler, Ph.D.

Affiliations: 
2013 Nanoscale Science and Engineering-Nanoscale Engineering State University of New York, Albany, Albany, NY, United States 
Area:
Nanotechnology
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"Aron Cepler"
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Bradley L. Thiel grad student 2013 SUNY Albany
 (Charged particle imaging methods for CD metrology of sub 22nm 3D device structures.)

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Publications

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Bunday B, Germer TA, Vartanian V, et al. (2013) Gaps analysis for CD metrology beyond the 22 nm node Proceedings of Spie - the International Society For Optical Engineering. 8681
Bunday B, Montgomery C, Montgomery W, et al. (2013) Photoresist shrinkage effects in 16 nm node extreme ultraviolet (EUV) photoresist targets Proceedings of Spie. 8681
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