Mark J. Kushner
Affiliations: | Electrical and Computer Engineering | Iowa State University, Ames, IA, United States |
Area:
Electronics and Electrical EngineeringGoogle:
"Mark Kushner"Children
Sign in to add traineeMingmei Wang | grad student | 2011 | Iowa State |
Juline Shoeb | grad student | 2012 | Iowa State |
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Publications
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Kruszelnicki J, Ma R, Kushner MJ. (2021) Propagation of atmospheric pressure plasmas through interconnected pores in dielectric materials Journal of Applied Physics. 129: 143302 |
Huang S, Shim S, Nam SK, et al. (2020) Pattern dependent profile distortion during plasma etching of high aspect ratio features in SiO2 Journal of Vacuum Science & Technology A. 38: 023001 |
Jung J, Barsukov Y, Volynets V, et al. (2020) Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. II. Surface reaction mechanism Journal of Vacuum Science & Technology A. 38: 023008 |
Volynets V, Barsukov Y, Kim G, et al. (2020) Highly selective Si3N4/SiO2 etching using an NF3/N2/O2/H2 remote plasma. I. Plasma source and critical fluxes Journal of Vacuum Science & Technology A. 38: 023007 |
Qu C, Nam SK, Kushner MJ. (2020) Transients using low-high pulsed power in inductively coupled plasmas Plasma Sources Science and Technology. 29: 85006 |
Qu C, Lanham SJ, Shannon SC, et al. (2020) Erratum: Power Matching to Pulsed Inductively Coupled Plasmas [J. Appl. Phys. 127, 133302 (2020)] Journal of Applied Physics. 128: 89901 |
Lietz AM, Barnat EV, Foster JE, et al. (2020) Ionization wave propagation in a He plasma jet in a controlled gas environment Journal of Applied Physics. 128: 83301 |
Qu C, Lanham SJ, Shannon SC, et al. (2020) Power matching to pulsed inductively coupled plasmas Journal of Applied Physics. 127: 133302 |
Mujahid Z, Kruszelnicki J, Hala A, et al. (2020) Formation of surface ionization waves in a plasma enhanced packed bed reactor for catalysis applications Chemical Engineering Journal. 382: 123038 |
Mohades S, Lietz AM, Kruszelnicki J, et al. (2020) Helium plasma jet interactions with water in well plates Plasma Processes and Polymers. 17: 1900179 |