Alexander K. Raub, Ph.D.

Affiliations: 
2010 Engineering University of New Mexico, Albuquerque, NM, United States 
Area:
Electronics and Electrical Engineering, Optics Physics
Google:
"Alexander Raub"

Parents

Sign in to add mentor
Steve Brueck grad student 2010 Univ. of New Mexico
 (Large area three-dimensional photonic crystals with embedded waveguides.)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Raub AK, Brueck SRJ. (2011) Large area 3D helical photonic crystals Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29
Raub AK, Brueck SRJ. (2010) Large area three-dimensional photonic crystals with embedded waveguides Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28
Liu CC, Nealey PF, Raub AK, et al. (2010) Integration of block copolymer directed assembly with 193 immersion lithography Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6B30-C6B34
Burckel DB, Washburn CM, Raub AK, et al. (2009) Lithographically defined porous carbon electrodes. Small (Weinheim An Der Bergstrasse, Germany). 5: 2792-6
Raub AK, Li D, Frauenglass A, et al. (2007) Fabrication of 22 nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2224-2227
Raub AK, Biswas AM, Borodovsky Y, et al. (2006) Simulation of dense contact hole (κ 1=0.35) arrays with 193-nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6154
Abdallah DJ, Neisser M, Dammel RR, et al. (2005) 193nm dual layer organic B.A.R.C.s for high NA immersion lithography Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 417-435
Raub AK, Frauenglass A, Brueck SRJ, et al. (2004) Deep-UV immersion interferometric lithography Proceedings of Spie - the International Society For Optical Engineering. 5377: 306-318
Raub AK, Frauenglass A, Brueck SRJ, et al. (2004) Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3459-3464
Raub AK, Brueck SRJ. (2003) Deep UV immersion interferometric lithography Proceedings of Spie - the International Society For Optical Engineering. 5040: 667-678
See more...