Vimal K. Kamineni, Ph.D.
Affiliations: | 2011 | Nanoscale Science and Engineering-Nanoscale Science | State University of New York, Albany, Albany, NY, United States |
Area:
Nanoscience, Materials Science Engineering, Condensed Matter PhysicsGoogle:
"Vimal Kamineni"Parents
Sign in to add mentor| Alain C. Diebold | grad student | 2011 | SUNY Albany | |
| (Electron-Phonon Interactions and Quantum Confinement Effects on Optical Transitions in Nanoscale Silicon Films.) | ||||
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Publications
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| Carr A, Peethala B, Raymond M, et al. (2017) Impact of surface preparation for n-type Si:P and p-type SiGe:B semiconductors on low resistance silicide contacts Microelectronic Engineering. 173: 22-26 |
| Dixit D, Green A, Hosler ER, et al. (2016) Optical critical dimension metrology for directed self-assembly assisted contact hole shrink Journal of Micro/ Nanolithography, Mems, and Moems. 15 |
| Dixit D, O'Mullane S, Sunkoju S, et al. (2015) Silicon fin line edge roughness determination and sensitivity analysis by Mueller matrix spectroscopic ellipsometry based scatterometry Proceedings of Spie - the International Society For Optical Engineering. 9424 |
| Dixit D, O'Mullane S, Sunkoju S, et al. (2015) Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Dixit DJ, Kamineni V, Farrell R, et al. (2015) Metrology for block copolymer directed self-assembly structures using Mueller matrix-based scatterometry Journal of Micro/ Nanolithography, Mems, and Moems. 14 |
| Dixit D, Kamineni V, Farrell R, et al. (2014) Metrology for directed self-assembly block lithography using optical scatterometry Proceedings of Spie. 9050 |
| Takamasu K, Okitou H, Takahashi S, et al. (2014) Sidewall roughness and line profile measurement of photoresist and finFET features by cross-section STEM and TEM image for reference metrology Proceedings of Spie. 9050 |
| Settens C, Cordes A, Bunday B, et al. (2014) Assessment of critical dimension small-angle x-ray scattering measurement approaches for FinFET fabrication process monitoring Journal of Micro/ Nanolithography, Mems, and Moems. 13 |
| Medikonda M, Muthinti GR, Fronheiser J, et al. (2014) Measurement of periodicity and strain in arrays of single crystal silicon and pseudomorphic Si |
| Diebold AC, Medikonda M, Muthinti GR, et al. (2013) Fin stress and pitch measurement using X-ray diffraction reciprocal space maps and optical scatterometry Proceedings of Spie - the International Society For Optical Engineering. 8681 |