Gregory Denbeaux

Affiliations: 
Nanoscale Science and Engineering-Nanoscale Science State University of New York, Albany, Albany, NY, United States 
Area:
Nanoscience, Nanotechnology, Materials Science Engineering
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"Gregory Denbeaux"

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Rashi Garg grad student 2008 SUNY Albany
Yu-Jen Fan grad student 2011 SUNY Albany
Chimaobi Mbanaso grad student 2011 SUNY Albany
Mihirkant Upadhyaya grad student 2014 SUNY Albany
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Publications

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Kandel Y, Denbeaux G. (2016) Simultaneous determination of electron beam profile and material response using self-consistent iterative method Japanese Journal of Applied Physics. 55
Upadhyaya M, Jindal V, Basavalingappa A, et al. (2015) Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach Journal of Micro/ Nanolithography, Mems, and Moems. 14
Upadhyaya M, Basavalingappa A, Herbol H, et al. (2015) Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33
Upadhyaya M, Jindal V, Herbol H, et al. (2014) Investigating printability of native defects on EUV mask blanks through simulations and experiments Proceedings of Spie - the International Society For Optical Engineering. 9048
Upadhyaya M, Kandel Y, Denbeaux G, et al. (2014) X-ray photoelectron spectroscopy process optimization for characterization of trace contamination elements for extreme ultraviolet resist outgassing study X-Ray Spectrometry. 43: 102-107
Upadhyaya M, Kandel Y, Denbeaux G, et al. (2013) Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing Proceedings of Spie - the International Society For Optical Engineering. 8679
Khopkar Y, Herbol H, Upadhyaya M, et al. (2012) Developing particle detection test bench for vacuum components Proceedings of Spie - the International Society For Optical Engineering. 8322
Mbanaso C, Denbeaux G, Antohe A, et al. (2011) Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources Proceedings of Spie - the International Society For Optical Engineering. 7969
Mbanaso C, Kruger S, Higgins C, et al. (2011) Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969
Khopkar Y, Thomas P, Yankulin L, et al. (2011) Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969
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