Chimaobi Mbanaso, Ph.D.

Affiliations: 
2011 Nanoscale Science and Engineering-Nanoscale Engineering State University of New York, Albany, Albany, NY, United States 
Area:
Nanoscience, Nanotechnology
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"Chimaobi Mbanaso"

Parents

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Gregory Denbeaux grad student 2011 SUNY Albany
 (Development of a gas-based spectral filter for carbon dioxide laser produced plasma extreme ultraviolet sources.)
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Publications

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Mbanaso C, Denbeaux G, Antohe A, et al. (2011) Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources Proceedings of Spie - the International Society For Optical Engineering. 7969
Mbanaso C, Kruger S, Higgins C, et al. (2011) Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969
Khopkar Y, Thomas P, Yankulin L, et al. (2011) Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969
Thomas P, Yankulin L, Khopkar Y, et al. (2010) Wavelength dependence of carbon contamination on mirrors with different capping layers Proceedings of Spie - the International Society For Optical Engineering. 7636
Fan YJ, Yankulin L, Antohe A, et al. (2010) Effect of carbon contamination on the printing performance of extreme ultraviolet masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 321-328
Antohe AO, Mbanaso C, Fan YJ, et al. (2009) EUV resist outgassing - Scaling to HVM intensity Proceedings of Spie - the International Society For Optical Engineering. 7271
Fan YJ, Yankulin L, Antohe A, et al. (2009) Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271
Waterman J, Mbanaso C, Denbeaux G. (2008) Vacuum induced photoresist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6921
Denbeaux G, Garg R, Waterman J, et al. (2007) Quantitative measurement of EUV resist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6533
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