Benedict Y. Johnson, Ph.D.

Affiliations: 
2001 University of Arizona, Tucson, AZ 
Area:
Materials Science Engineering
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"Benedict Johnson"

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Supapan Seraphin grad student 2001 University of Arizona
 (Correlation of the microstructure and processing conditions of ultra-thin oxygen -implanted silicon -on -insulator materials.)
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Johnson B, Jeoung JS, Anderson P, et al. (2002) Evolution of microstructure during annealing of low-dose SIMOX wafers implanted at 65 keV Journal of Materials Science: Materials in Electronics. 13: 303-308
Johnson B, Tan Y, Anderson P, et al. (2001) The Effects of Surface Capping during Annealing on the Microstructure of Ultrathin SIMOX Materials Journal of the Electrochemical Society. 148
Tan Y, Johnson B, Seraphin S, et al. (2001) Effect of annealing conditions on the formation of low-dose SIMOX structures implanted at 190 keV Journal of Materials Science: Materials in Electronics. 12: 537-542
Jeoung JS, Johnson B, Seraphin S. (2001) Growth of Oxygen Precipitates in Low-Dose Low-Energy Simox Microscopy and Microanalysis. 7: 562-563
Johnson B, Anderson P, Tan Y, et al. (2000) Effect Of Capping Layer During Annealing of Low-Dose Lowenergy Simox Materials Microscopy and Microanalysis. 6: 1090-1091
Tan Y, Johnson B, Seraphin S, et al. (2000) Defect Dynamics in Simox Structures as a Function of the Annealing Parameters Microscopy and Microanalysis. 6: 1086-1087
Jiao J, Johnson B, Seraphin S, et al. (2000) Formation of Si islands in the buried oxide layers of ultra-thin SIMOX structures implanted at 65 keV Materials Science and Engineering B: Solid-State Materials For Advanced Technology. 72: 150-155
Johnson B, Jiao J, Seraphin S, et al. (1999) Control of Si-Island Free Ultra-Thin Simox Structures by Implant Energy and Oxygen Dose Microscopy and Microanalysis. 5: 746-747
Wilson T, Jiao J, Seraphin S, et al. (1999) Effects of Protective Capping on Ultra-Thin SIMOX Structures Microscopy and Microanalysis. 5: 744-745
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