Lin Sha, Ph.D.
Affiliations: | 2003 | University of California, Los Angeles, Los Angeles, CA |
Area:
Chemical EngineeringGoogle:
"Lin Sha"Parents
Sign in to add mentorJane P. Chang | grad student | 2003 | UCLA | |
(Plasma etching chemistries and reaction mechanisms for patterning high dielectric constant materials on silicon.) |
BETA: Related publications
See more...
Publications
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
Sha L. (2007) Characteristics of HF CVD diamond thin films on cemented carbides Surface Review and Letters. 14: 451-459 |
Sha L, Chang JP. (2004) Plasma etching of high dielectric constant materials on silicon in halogen chemistries Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 88-95 |
Ni D, Lou Y, Christofides PD, et al. (2004) Real-time carbon content control for PECVD ZrO/sub 2/ thin-film growth Ieee Transactions On Semiconductor Manufacturing. 17: 221-230 |
Huang TJ, Tseng HR, Sha L, et al. (2004) Mechanical shuttling of linear motor-molecules in condensed phases on solid substrates Nano Letters. 4: 2065-2071 |
Sha L, Chang JP. (2003) Plasma etching selectivity of ZrO |
Sha L, Cho BO, Chang JP. (2002) Ion-enhanced chemical etching of ZrO |
Cho BO, Wang J, Sha L, et al. (2002) Tuning the electrical properties of zirconium oxide thin films Applied Physics Letters. 80: 1052-1054 |
Cho BO, Lao S, Sha L, et al. (2001) Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 19: 2751-2761 |