Ching-Huang Lu, Ph.D.
Affiliations: | 2007 | Stanford University, Palo Alto, CA |
Area:
Materials Science Engineering, Electronics and Electrical EngineeringGoogle:
"Ching-Huang Lu"Parents
Sign in to add mentor| Yoshio Nishi | grad student | 2007 | Stanford | |
| (Bilayer metal gate electrodes with tunable work function: Behavior, mechanism, and device characteristics.) | ||||
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| Wang C, Lee WY, Kong D, et al. (2015) Significance of the double-layer capacitor effect in polar rubbery dielectrics and exceptionally stable low-voltage high transconductance organic transistors. Scientific Reports. 5: 17849 |
| Birringer RP, Lu CH, Deal M, et al. (2010) Bilayer metal gate electrodes with tunable work function: Adhesion and interface characterization Journal of Applied Physics. 108 |
| Lu CH, Wong GMT, Birringer R, et al. (2010) Bilayer metal gate electrodes with tunable work function: Mechanism and proposed model Journal of Applied Physics. 107 |
| Lu CH, Wong GMT, Deal MD, et al. (2005) Characteristics and mechanism of tunable work function gate electrodes using a bilayer metal structure on SiO2 and HfO2 Ieee Electron Device Letters. 26: 445-447 |