Julie L. Ngau, Ph.D.
Affiliations: | 2003 | Stanford University, Palo Alto, CA |
Area:
Materials Science EngineeringGoogle:
"Julie Ngau"Parents
Sign in to add mentorJames D. Plummer | grad student | 2003 | Stanford | |
(Process technology development for advanced silicon heterostructure devices.) |
BETA: Related publications
See more...
Publications
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
Ngau JL, Griffin PB, Plummer JD. (2002) Silicon orientation effects in the initial regime of wet oxidation Journal of the Electrochemical Society. 149 |
Ngau JL, Griffin PB, Plummer JD. (2001) A Comprehensive Model for Carbon Suppression of Boron Transient Enhanced Diffusion Mrs Proceedings. 669 |
Ngau JL, Griffin PB, Plummer JD. (2001) Modeling the suppression of boron transient enhanced diffusion in silicon by substitutional carbon incorporation Journal of Applied Physics. 90: 1768-1778 |
Ngau JL, Griffin PB, Plummer JD. (2001) A comprehensive model for carbon suppression of boron transient enhanced diffusion Materials Research Society Symposium - Proceedings. 669 |