Jason A. Kenney, Ph.D.

Affiliations: 
2006 Chemical Engineering University of Texas at Austin, Austin, Texas, U.S.A. 
Area:
Chemical Engineering
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"Jason Kenney"

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Gyeong S. Hwang grad student 2006 UT Austin
 (Transient charging processes at liquid-solid and vacuum -solid interfaces.)
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Publications

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Wang J, Tian W, Rauf S, et al. (2018) A model for etching of three-dimensional high aspect ratio silicon structures in pulsed inductively coupled plasmas Plasma Sources Science and Technology. 27: 94003
Agarwal A, Bera K, Kenney J, et al. (2017) Modeling of low pressure plasma sources for microelectronics fabrication Journal of Physics D. 50: 424001
Dorf L, Wang J, Rauf S, et al. (2017) Etching with atomic precision by using low electron temperature plasma Journal of Physics D. 50: 274003
Dorf L, Wang J-, Rauf S, et al. (2016) Atomic precision etch using a low-electron temperature plasma Proceedings of Spie. 9782
Agarwal A, Kenney JA, Rauf S, et al. (2014) Fully self-consistent 3-D modeling of inductively coupled plasmas Ieee Transactions On Plasma Science. 42: 2832-2833
Rauf S, Dorf L, Kenney J, et al. (2013) Energy distribution of electron flux at electrodes in a low pressure capacitively coupled plasma Journal of Applied Physics. 113: 023306
Chen Z, Kenney J, Rauf S, et al. (2011) Effect of segmenting powered electrode on plasma uniformity in large-area capacitively coupled plasma discharge Ieee Transactions On Plasma Science. 39: 2526-2527
Kenney JA, Rauf S, Collins K. (2011) Capacitively coupled plasma with an asymmetric dielectric plate Ieee Transactions On Plasma Science. 39: 2524-2525
Bera K, Rauf S, Kenney J, et al. (2010) Influence of inhomogeneous magnetic field on the characteristics of very high frequency capacitively coupled plasmas Journal of Applied Physics. 107: 053302
Kenney JA, Rauf S, Collins K. (2009) Effect of azimuthally asymmetric reactor components on a parallel plate capacitively coupled plasma Journal of Applied Physics. 106
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