Zachary R. Robinson, Ph.D.
Affiliations: | 2012 | Nanoscale Science and Engineering-Nanoscale Science | State University of New York, Albany, Albany, NY, United States |
Area:
Condensed Matter Physics, NanoscienceGoogle:
"Zachary Robinson"Parents
Sign in to add mentor| Carl A. Ventrice | grad student | 2012 | SUNY Albany | |
| (The influence of copper substrate orientation on graphene growth.) | ||||
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Publications
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| Kozen AC, Robinson ZR, Glaser ER, et al. (2020) In Situ Hydrogen Plasma Exposure for Varying the Stoichiometry of Atomic Layer Deposited Niobium Oxide Films for Use in Neuromorphic Computing Applications. Acs Applied Materials & Interfaces |
| Woodward JM, Rosenberg SG, Kozen AC, et al. (2019) Influence of temperature on atomic layer epitaxial growth of indium nitride assessed within situgrazing incidence small-angle x-ray scattering Journal of Vacuum Science & Technology A. 37: 030901 |
| Rosenberg SG, Wagenbach C, Anderson VR, et al. (2019) In situ studies of low temperature atomic level processing of GaN surfaces for atomic layer epitaxial growth Journal of Vacuum Science & Technology A. 37: 020928 |
| Rosenberg SG, Pennachio DJ, Wagenbach C, et al. (2019) Low temperature surface preparation of GaN substrates for atomic layer epitaxial growth: Assessment of ex situ preparations Journal of Vacuum Science & Technology A. 37: 020908 |
| Nepal N, Anderson VR, Johnson SD, et al. (2019) Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InN monitored by real time grazing incidence small angle x-ray scattering Journal of Vacuum Science & Technology A. 37: 020910 |
| Boris DR, Anderson VR, Nepal N, et al. (2018) Effect of varying plasma properties on III-nitride film growth by plasma enhanced atomic layer epitaxy Journal of Vacuum Science & Technology A. 36: 051503 |
| Anderson VR, Nepal N, Johnson SD, et al. (2017) Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 031508 |
| Nepal N, Anderson VR, Johnson SD, et al. (2017) Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods Journal of Vacuum Science & Technology a: Vacuum, Surfaces, and Films. 35: 031504 |
| Johnson SD, Gonzalez CM, Anderson V, et al. (2017) Magnetic and structural properties of sintered bulk pucks and aerosol deposited films of Ti-doped barium hexaferrite for microwave absorption applications Journal of Applied Physics. 122: 024901 |
| Tadjer MJ, Wheeler VD, Downey BP, et al. (2017) Temperature and electric field induced metal-insulator transition in atomic layer deposited VO2 thin films Solid-State Electronics. 136: 30-35 |