Na Cai, Ph.D.

Affiliations: 
2012 Mechanical Engineering State University of New York at Binghamton, Vestal, NY, United States 
Area:
Materials Science Engineering, Inorganic Chemistry
Google:
"Na Cai"

Parents

Sign in to add mentor
Guangwen Zhou grad student 2012 SUNY Binghamton
 (Study of the oxidation of aluminum and copper: From oxygen surface chemisorption to the growth of continuous oxide films.)
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Chen X, Shan W, Wu D, et al. (2023) Atomistic mechanisms of water vapor-induced surface passivation. Science Advances. 9: eadh5565
Shan W, Liu Q, Li J, et al. (2016) Hydrogen-induced atomic structure evolution of the oxygen-chemisorbed Cu(110) surface. The Journal of Chemical Physics. 145: 234704
Cai N, Liu Q, Tong X, et al. (2014) X-ray photoelectron spectroscopy study of the passivation of NiAl(100) by water vapor. Langmuir : the Acs Journal of Surfaces and Colloids. 30: 774-83
Liu Q, Li L, Cai N, et al. (2014) Oxygen chemisorption-induced surface phase transitions on Cu(110) Surface Science. 627: 75-84
Li L, Cai N, Saidi WA, et al. (2014) Role of oxygen in Cu(1 1 0) surface restructuring in the vicinity of step edges Chemical Physics Letters. 613: 64-69
Cai N, Qin H, Tong X, et al. (2013) Growth of ultrathin amorphous alumina films during the oxidation of NiAl(100) Surface Science. 618: 20-26
Cai N, Zhou G, Müller K, et al. (2012) Temperature and pressure dependent Mott potentials and their influence on self-limiting oxide film growth Applied Physics Letters. 101: 171605
Cai N, Zhou G, Müller K, et al. (2012) Comparative Study of the Passivation of Al(111) by Molecular Oxygen and Water Vapor The Journal of Physical Chemistry C. 117: 172-178
Cai N, Zhou G, Müller K, et al. (2011) Tuning the limiting thickness of a thin oxide layer on Al(111) with oxygen gas pressure. Physical Review Letters. 107: 035502
Cai N, Zhou G, Müller K, et al. (2011) Effect of oxygen gas pressure on the kinetics of alumina film growth during the oxidation of Al(111) at room temperature Physical Review B. 84
See more...