Milan Diebel, Ph.D.
Affiliations: | 2004 | University of Washington, Seattle, Seattle, WA |
Area:
Condensed Matter Physics, Electronics and Electrical Engineering, Materials Science EngineeringGoogle:
"Milan Diebel"Parents
Sign in to add mentor| Scott T. Dunham | grad student | 2004 | University of Washington | |
| (Application of ab-initio calculations to modeling of nanoscale diffusion and activation in silicon.) | ||||
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Publications
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| Diebel M, Kennel HW, Giles MD. (2007) Ab-initio calculations of shear stress effects on defects and diffusion in silicon International Conference On Simulation of Semiconductor Processes and Devices, Sispad. 75-78 |
| Ahn C, Diebel M, Dunham ST. (2006) First principles calculations of dopant solubility based on strain compensation and direct binding between dopants and group IV impurities Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 700-704 |
| Dunham ST, Diebel M, Ahn C, et al. (2006) Calculations of effect of anisotropic stress/strain on dopant diffusion in silicon under equilibrium and nonequilibrium conditions Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 24: 456-461 |
| Diebel M, Dunham ST. (2006) Diebel and Dunham Reply: Physical Review Letters. 96 |
| Fiorentini V, Lopez GM, Diebel M, et al. (2006) Comment on Ab initio calculations to model anomalous fluorine behavior Physical Review Letters. 96 |
| Diebel M, Dunham ST. (2004) Ab initio calculations to model anomalous fluorine behavior. Physical Review Letters. 93: 245901 |
| Diebel M, Chakravarthi S, Dunham ST, et al. (2003) Investigation and modeling of fluorine co-implantation effects on dopant redistribution Materials Research Society Symposium - Proceedings. 765: 211-216 |
| Diebel M, Dunham ST. (2003) Ab-initio calculations to predict stress effects on defects and diffusion in silicon International Conference On Simulation of Semiconductor Processes and Devices, Sispad. 2003: 147-150 |
| Chakravarthi S, Diebel M, Chidambaram PR, et al. (2003) Process modeling based on atomistic understanding for state of the art CMOS device design 2003 Nanotechnology Conference and Trade Show - Nanotech 2003. 2: 121-124 |
| Diebel M, Dunham ST. (2002) Ab-initio calculations to model anomalous fluorine behavior Materials Research Society Symposium - Proceedings. 717: 169-174 |