Filippos Papadatos, Ph.D.
Affiliations: | 2006 | State University of New York, Albany, Albany, NY, United States |
Area:
Materials Science Engineering, Condensed Matter PhysicsGoogle:
"Filippos Papadatos"Parents
Sign in to add mentor| Eric T. Eisenbraun | grad student | 2006 | SUNY Albany | |
| (Properties of ruthenium-based thin films grown by chemical vapor deposition (CVD) and atomic layer deposition (ALD) methods for future complementary metal oxide semiconductor (CMOS) gate electrode applications.) | ||||
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| Papadatos F, Consiglio S, Skordas S, et al. (2007) A study of ruthenium ultrathin film nucleation on pretreated SiO2 and Hf-silicate dielectric surfaces Journal of Materials Research. 22: 2254-2264 |
| Consiglio S, Papadatos F, Naczas S, et al. (2006) Metallorganic chemical vapor deposition of hafnium silicate thin films using a dual source dimethyl-alkylamido approach Journal of the Electrochemical Society. 153 |
| Skordas S, Papadatos F, Consiglio S, et al. (2005) Electrical properties of ultrathin Al2O3 films grown by metalorganic chemical vapor deposition for advanced complementary metal-oxide semiconductor gate dielectric applications Journal of Materials Research. 20: 1536-1543 |
| Papadatos F, Consiglio S, Skordas S, et al. (2004) Chemical vapor deposition of ruthenium and ruthenium oxide thin films for advanced complementary metal-oxide semiconductor gate electrode applications Journal of Materials Research. 19: 2947-2955 |
| Skordas S, Papadatos F, Nuesca G, et al. (2003) Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications Journal of Materials Research. 18: 1868-1876 |
| Hoover CA, Litwin MM, Peck J, et al. (2003) Advanced ruthenium precursors for thin film deposition Proceedings - Electrochemical Society. 22: 237-249 |
| Skordas S, Papadatos F, Consiglio S, et al. (2002) Interface Quality and Electrical Performance of Low-Temperature Metal Organic Chemical Vapor Deposition Aluminum Oxide Thin Films for Advanced CMOS Gate Dielectric Applications Mrs Proceedings. 745 |
| Papadatos F, Skordas S, Consiglio S, et al. (2002) Characterization of ruthenium and ruthenium oxide thin films deposited by chemical vapor deposition for CMOS gate electrode applications Materials Research Society Symposium - Proceedings. 745: 61-66 |
| Skordas S, Papadatos F, Patel Z, et al. (2002) Low temperature metal organic chemical vapor deposition of aluminum oxide thin films for advanced CMOS gate dielectric applications Materials Research Society Symposium - Proceedings. 716: 183-188 |
| Papadatos F, Skordas S, Patel Z, et al. (2002) Chemical vapor deposition of Ru and RuO2 for gate electrode applications Materials Research Society Symposium - Proceedings. 716: 79-84 |