Heather R. Lazar, Ph.D.
Affiliations: | 2005 | North Carolina State University, Raleigh, NC |
Area:
Electronics and Electrical EngineeringGoogle:
"Heather Lazar"Parents
Sign in to add mentor| Veena Misra | grad student | 2005 | NCSU | |
| (Mobility degradation of advanced CMOS gatestacks.) | ||||
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Publications
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| Chen B, Jha R, Lazar H, et al. (2006) Influence of oxygen diffusion through capping layers of low work function metal gate electrodes Ieee Electron Device Letters. 27: 228-230 |
| Suh Y, Lazar H, Chen B, et al. (2005) Electrical Characteristics of HfO[sub 2] Dielectrics with Ru Metal Gate Electrodes Journal of the Electrochemical Society. 152: F138 |
| Misra V, Zhong H, Lazar H. (2002) Electrical properties of Ru-based alloy gate electrodes for dual metal gate Si-CMOS Ieee Electron Device Letters. 23: 354-356 |
| Lazar HR, Misra V, Johnson RS, et al. (2001) Characteristics of metalorganic remote plasma chemical vapor deposited Al2O3 gate stacks on SiC metal–oxide–semiconductor devices Applied Physics Letters. 79: 973-975 |
| Misra V, Lazar H, Kulkami M, et al. (1999) Interfacial Properties of Si-Si3N4formed by Remote Plasma Enhanced Chemical Vapor Deposition Mrs Proceedings. 567 |
| Misra V, Lazar H, Wang Z, et al. (1999) Interfacial properties of ultrathin pure silicon nitride formed by remote plasma enhanced chemical vapor deposition Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 17: 1836 |