Balaji Raghothamachar, Ph.D.

Affiliations: 
2001 Stony Brook University, Stony Brook, NY, United States 
Area:
Materials Science Engineering
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"Balaji Raghothamachar"

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Michael Dudley grad student 2001 SUNY Stony Brook
 (Synchrotron white beam X -ray characterization of growth defects in bulk compound semiconductors.)
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Publications

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Huang VW, Liu Y, Raghothamachar B, et al. (2023) Upgraded for rapid recognition and fitting of Laue patterns from crystals with unknown orientations. Journal of Applied Crystallography. 56: 1610-1615
Dalmau R, Britt J, Fang HY, et al. (2020) X-Ray Topography Characterization of Large Diameter AlN Single Crystal Substrates Materials Science Forum. 1004: 63-68
Ailihumaer T, Raghothamachar B, Dudley M, et al. (2020) Investigation of Dislocation Behavior at the Early Stage of PVT-Grown 4H-SiC Crystals Materials Science Forum. 1004: 44-50
Ailihumaer T, Peng H, Raghothamachar B, et al. (2020) Synchrotron X-Ray Topography Study on the Relationship between Local Basal Plane Bending and Basal Plane Dislocations in PVT-Grown 4H-SiC Substrate Wafers Materials Science Forum. 1004: 393-400
Yang L, Zhao LX, Wu HW, et al. (2020) Characterization and Reduction of Defects in 4H-SiC Substrate and Homo-Epitaxial Wafer Materials Science Forum. 1004: 387-392
Manning I, Matsuda Y, Chung G, et al. (2020) Progress in Bulk 4H SiC Crystal Growth for 150 mm Wafer Production Materials Science Forum. 1004: 37-43
Renz AB, Shah VA, Vavasour OJ, et al. (2020) The improvement of Mo/4H-SiC Schottky diodes via a P2O5 surface passivation treatment Journal of Applied Physics. 127: 025704
Raghothamachar B, Liu Y, Peng H, et al. (2020) X-ray topography characterization of gallium nitride substrates for power device development Journal of Crystal Growth. 544: 125709
Peng H, Ailihumaer T, Liu Y, et al. (2020) Characterization of defects and strain in the (AlxGa(1−x))0.5In0.5P/ GaAs system by synchrotron X-ray topography Journal of Crystal Growth. 533: 125458
Peng H, Ailihumaer T, Raghothamachar B, et al. (2020) Ray Tracing Simulation of Images of Dislocations and Inclusions on X-Ray Topographs of GaAs Epitaxial Wafers Journal of Electronic Materials. 49: 3472-3480
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