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Honglin Zhu, Ph.D.

Affiliations: 
2002 Rutgers University, New Brunswick, New Brunswick, NJ, United States 
Area:
Chemical Engineering, Materials Science Engineering, Electronics and Electrical Engineering
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Dale E. Niesz grad student 2002 Rutgers, New Brunswick
 (Chemical mechanical polishing (CMP) of sapphire.)

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Publications

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Zhu H, Niesz DE, Greenhut VA, et al. (2005) The effect of abrasive hardness on the chemical-assisted polishing of (0001) plane sapphire Journal of Materials Research. 20: 504-520
Zhu H, Tessaroto LA, Sabia R, et al. (2004) Chemical mechanical polishing (CMP) anisotropy in sapphire Applied Surface Science. 236: 120-130
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