Paul G. Snyder

Affiliations: 
The University of Nebraska - Lincoln, Lincoln, NE 
Area:
Electronics and Electrical Engineering
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"Paul Snyder"
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Publications

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Thompson DW, Snyder PG, Castro L, et al. (2005) Optical characterization of porous alumina from vacuum ultraviolet to midinfrared Journal of Applied Physics. 97
Cho SJ, Snyder PG, Ianno NJ, et al. (2004) Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometry Thin Solid Films. 455: 645-649
Cho S, Snyder PG, Herzinger CM, et al. (2002) Etch depth control in bulk GaAs using patterning and real time spectroscopic ellipsometry Journal of Vacuum Science & Technology B. 20: 197-202
Mo Y, Dillon RO, Snyder PG. (1999) Visible and infrared photochromic properties of amorphous WO3−x films Journal of Vacuum Science and Technology. 17: 2933-2938
Mo Y, Dillon RO, Snyder PG. (1999) Spectroscopic analysis of photochromic films Journal of Vacuum Science and Technology. 17: 170-175
Mo Y, Dillon RO, Snyder PG, et al. (1999) Optical properties of photochromic organic–inorganic composites Thin Solid Films. 355: 1-5
Cho S, Snyder PG. (1998) In Situ Control of Wet Etching Using Spectroscopic Ellipsometry Mrs Proceedings. 535: 201
Snyder PG, Tiwald TE, Thompson DW, et al. (1998) Infrared free carrier response of In0.15Ga0.85As0.17Sb0.83 epilayers on GaSb Thin Solid Films. 313: 667-670
Ahmad AA, Ianno NJ, Snyder PG, et al. (1996) Optical properties of boron carbide (B5C) thin films fabricated by plasma‐enhanced chemical‐vapor deposition Journal of Applied Physics. 79: 8643-8647
Herzinger CM, Snyder PG, Celii FG, et al. (1996) Studies of thin strained InAs, AlAs, and AlSb layers by spectroscopic ellipsometry Journal of Applied Physics. 79: 2663-2674
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