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Roland A. Levy

Affiliations: 
New Jersey Institute of Technology, Newark, NJ, United States 
Area:
Materials Science Engineering, Chemical Engineering
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"Roland Levy"
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Narahari Ramanuja grad student 2000 NJIT
Weizhong Chen grad student 2008 NJIT
Sipeng Gu grad student 2008 NJIT
Naruemon Suwattananont grad student 2010 NJIT

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Publications

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Suh Y, Chen W, Maeng S, et al. (2010) Synthesis and characterization of plasma assisted chemically vapor deposited tantalum Thin Solid Films. 518: 5452-5456
Gu S, Maeng S, Suh Y, et al. (2010) Investigation of atmospheric pressure CVD-produced aluminum coatings for the protection of steel from corrosion Chemical Vapor Deposition. 16: 231-238
Carroll MS, Suh YS, Levy R. (2008) Nonlocal reduced boron diffusivity in silicon below strained Si 1-xGex surfaces Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 26: 72-75
Sahiner MA, Ansari P, Carroll MS, et al. (2005) Clustering analysis in boron and phosphorus implanted (100) germanium by x-ray absorption spectroscopy Mrs Proceedings. 864: 351-356
Suh YS, Carroll MS, Levy RA, et al. (2005) Implantation and activation of high concentrations of boron in germanium Ieee Transactions On Electron Devices. 52: 2416-2421
Li Y, Li L, Selvan JAA, et al. (2005) Effects of seeding methods on the fabrication of microcrystalline silicon solar cells using radio frequency plasma enhanced chemical vapor deposition Thin Solid Films. 483: 84-88
Li L, Li YM, Selvan JAA, et al. (2004) Correlations between structural properties and performance of microcrystalline silicon solar cells fabricated by conventional RF-PECVD Journal of Non-Crystalline Solids. 347: 106-113
Ramanuja N, Levy RA, Dharmadhikari SN, et al. (2002) Synthesis and characterization of low pressure chemically vapor deposited titanium nitride films using TiCl4 and NH3 Materials Letters. 57: 261-269
Levy RA, Chen L, Grow JM, et al. (2002) A comparative study of plasma enhanced chemically vapor deposited SiOH and SiNCH films using the environmentally benign precursor diethylsilane Materials Letters. 54: 102-107
Levy RA, Zaitsev VB, Aryusook K, et al. (1998) Investigation of CF3I as an environmentally benign dielectric etchant Journal of Materials Research. 13: 2643-2648
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