Siddhartha K. Pradhan, Ph.D.

Affiliations: 
2003 University of Kentucky, Lexington, KY 
Area:
Materials Science Engineering
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"Siddhartha Pradhan"

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Philip J. Reucroft grad student 2003 University of Kentucky
 (Growth of crystalline alumina and titanium -oxynitride thin films by metalorganic chemical vapor deposition.)
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Publications

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Sarkar S, Pradhan SK, Jeevitha M. (2018) Factors influencing the nanostructure of obliquely deposited thin films Surface Engineering. 35: 227-233
Sarkar S, Pradhan SK. (2014) Tailoring of optical and wetting properties of sputter deposited silica thin films by glancing angle deposition Applied Surface Science. 290: 509-513
Pradhan SS, Pradhan S, Bhavanasi V, et al. (2012) Low temperature stabilized rutile phase TiO2 films grown by sputtering Thin Solid Films. 520: 1809-1813
Pradhan SS, Pradhan SK, Barhai PK. (2011) Structure and morphology evolution of TiO 2 films grown by sputtering 2011 International Conference On Nanoscience, Technology and Societal Implications, Nstsi11
Pradhan SS, Pradhan SK, Bagchi S, et al. (2011) Root growth of TiO 2 nanorods by sputtering Journal of Crystal Growth. 330: 1-4
Pradhan SK, Nouveau C, Vasin A, et al. (2005) Deposition of CrN coatings by PVD methods for mechanical application Surface and Coatings Technology. 200: 141-145
Pradhan SK, Reucroft PJ, Ko Y. (2004) Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition Surface & Coatings Technology. 176: 382-384
Pradhan SK, Dwarakadasa ES, Reucroft PJ. (2004) Processing and characterization of coconut shell powder filled UHMWPE Materials Science and Engineering A. 367: 57-62
Pradhan SK, Reucroft PJ, Yang F, et al. (2003) Growth of TiO2 nanorods by metalorganic chemical vapor deposition Journal of Crystal Growth. 256: 83-88
Pradhan SK, Reucroft PJ. (2003) A study of growth and morphological features of TiOxNy thin films prepared by MOCVD Journal of Crystal Growth. 250: 588-594
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