Phillip L. Reu, Ph.D.
Affiliations: | 2001 | University of Wisconsin, Madison, Madison, WI |
Area:
Mechanical EngineeringGoogle:
"Phillip Reu"Parents
Sign in to add mentor| Roxann L. Engelstad | grad student | 2001 | UW Madison | |
| (Comparative analysis of next generation lithography masks: PREVAIL and SCALPEL technologies.) | ||||
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Publications
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| Feng Z, Lovell EG, Engelstad RL, et al. (2003) EUV mask stress mapping by an experimental and hybrid finite element technique Proceedings of Spie - the International Society For Optical Engineering. 5037: 879-889 |
| Wood OR, Reu PL, Engelstad RL, et al. (2003) Reduction of image placement errors in EPL masks Proceedings of Spie - the International Society For Optical Engineering. 5037: 521-530 |
| Reu PL, Chen CF, Engelstad RL, et al. (2003) Predicting overlay performance for electron-projection-lithography masks Journal of Microlithography, Microfabrication and Microsystems. 2: 148-156 |
| Cotte EP, Mikkelson AR, Matesanz O, et al. (2003) Predicting critical dimension uniformity in advanced electron-beam projection lithography masks Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 21: 3027-3031 |
| Reu PL, Engelstad RL, Lovell EG. (2003) Mask distortion issues for next-generation lithography Microelectronic Engineering. 69: 420-428 |
| Feng Z, Lovell EG, Engelstad RL, et al. (2002) Film stress characterization using substrate shape data and numerical techniques Materials Research Society Symposium - Proceedings. 750: 249-254 |
| Reu PL, Chen CF, Engelstad RL, et al. (2002) Predicting overlay performance for electron projection lithography masks Proceedings of Spie - the International Society For Optical Engineering. 4688: 547-558 |
| Cotte EP, Reu PL, Engelstad RL, et al. (2002) Experimental and numerical studies of the response of photomask hard pellicles to acoustic excitation Proceedings of Spie - the International Society For Optical Engineering. 4889: 1121-1132 |
| Reu PL, Chen CF, Engelstad RL, et al. (2002) Electron projection lithography mask format layer stress measurement and simulation of pattern transfer distortion Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 3053-3057 |
| Abdo AY, Reu PL, Schlax MP, et al. (2001) Experimental model verification of the thermal response of optical reticles Proceedings of Spie - the International Society For Optical Engineering. 4346: 1478-1483 |