William G. Oldham
Affiliations: | University of California, Berkeley, Berkeley, CA, United States |
Area:
Electronics and Electrical EngineeringWebsite:
https://www2.eecs.berkeley.edu/Faculty/Homepages/oldham.htmlGoogle:
"William G. Oldham"Bio:
https://www2.eecs.berkeley.edu/Pubs/Dissertations/Faculty/oldham.html
DOI: 10.1016/0038-1101(63)90005-4
Parents
Sign in to add mentor| Arthur G. Milnes | grad student | 1963 | Carnegie Institute of Technology | |
| (Semiconductor Heterojunctions) | ||||
Children
Sign in to add trainee| Charles G. Sodini | grad student | 1982 | UC Berkeley |
| S Simon Wong | grad student | 1983 | UC Berkeley |
| Yashesh A. Shroff | grad student | 2003 | UC Berkeley |
| Yijian Chen | grad student | 2004 | UC Berkeley |
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Oldham WG, Shroff Y. (2004) Mirror-based pattern generation for maskless lithography Microelectronic Engineering. 73: 42-47 |
| Shroff Y, Chen Y, Oldham W. (2001) Fabrication of parallel-plate nanomirror arrays for extreme ultraviolet maskless lithography Journal of Vacuum Science & Technology B. 19: 2412-2415 |
| Choksi N, Pickard DS, McCord M, et al. (1999) Maskless extreme ultraviolet lithography Journal of Vacuum Science & Technology B. 17: 3047-3051 |
| Schenker R, Oldham W. (1996) Effects of compaction on 193 nm lithographic system performance Journal of Vacuum Science & Technology B. 14: 3709-3713 |
| Fields CH, Oldham WG, Ray‐Chaudhuri AK, et al. (1996) Direct aerial image measurements to evaluate the performance of an extreme ultraviolet projection lithography system Journal of Vacuum Science & Technology B. 14: 4000-4003 |
| Bokor J, Neureuther AR, Oldham WG. (1996) Advanced lithography for ULSI Ieee Circuits and Devices Magazine. 12: 11-15 |
| Shih YC, Zhang G, Hu C, et al. (1995) Thin dielectric degradation during silicon selective epitaxial growth process Applied Physics Letters. 67: 2040-2042 |
| Shih Y, Lou J, Oldham WG. (1994) Seam line defects in silicon‐on‐insulator by merged epitaxial lateral overgrowth Applied Physics Letters. 65: 1638-1640 |
| Shacham‐Diamand Y, Dedhia A, Hoffstetter D, et al. (1993) Copper transport in thermal SiO2 Journal of the Electrochemical Society. 140: 2427-2432 |
| Partlo WN, Fields CH, Oldham WG. (1993) Direct aerial image measurement as a method of testing high numerical aperture microlithographic lenses Journal of Vacuum Science & Technology B. 11: 2686-2691 |