Michael P. Hughey, Ph.D.
Affiliations: | 2005 | University of Minnesota, Twin Cities, Minneapolis, MN |
Area:
Chemical Engineering, Materials Science EngineeringGoogle:
"Michael Hughey"Parents
Sign in to add mentor| C. Barry Carter | grad student | 2005 | UMN | |
| (Chemical and thermo-mechanical stability of dielectric films.) | ||||
BETA: Related publications
See more...
Publications
|
You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect. |
| Hughey MP, Cook RF. (2005) Stress development kinetics in plasma-enhanced chemical-vapor-deposited silicon nitride films Journal of Applied Physics. 97: 114914 |
| Hughey MP, Cook RF, Thurn J. (2005) Stress stability and thermo-mechanical properties of reactively sputtered alumina films Journal of Materials Science. 40: 6345-6355 |
| Hughey MP, Cook RF. (2004) Hydrogen diffusion as the rate-limiting mechanism of stress development in dielectric films Applied Physics Letters. 85: 404-406 |
| Thurn J, Hughey MP. (2004) Evaluation of film biaxial modulus and coefficient of thermal expansion from thermoelastic film stress measurements Journal of Applied Physics. 95: 7892-7897 |
| Hughey MP, Cook RF. (2004) Massive stress changes in plasma-enhanced chemical vapor deposited silicon nitride films on thermal cycling Thin Solid Films. 460: 7-16 |
| Hughey MP, Cook RF. (2003) Irreversible Tensile Stress Development in PECVD Silicon Nitride Films Mrs Proceedings. 795 |