Chirag Gupta

Affiliations: 
2013- Electrical & Computer Engineering University of California, Santa Barbara, Santa Barbara, CA, United States 
Google:
"Chirag Gupta"
BETA: Related publications

Publications

You can help our author matching system! If you notice any publications incorrectly attributed to this author, please sign in and mark matches as correct or incorrect.

Pasayat SS, Gupta C, Wang Y, et al. (2020) Compliant Micron-Sized Patterned InGaN Pseudo-Substrates Utilizing Porous GaN. Materials (Basel, Switzerland). 13
Raj A, Krishna A, Hatui N, et al. (2020) Demonstration of a GaN/AlGaN Superlattice-Based p-Channel FinFET With High ON-Current Ieee Electron Device Letters. 41: 220-223
Hatui N, Krishna A, Li H, et al. (2020) Ultra-high silicon doped N-polar GaN contact layers grown by metal-organic chemical vapor deposition Semiconductor Science and Technology. 35: 95002
Li W, Pasayat SS, Guidry M, et al. (2020) First experimental demonstration and analysis of electrical transport characteristics of a GaN-based HEMT with a relaxed InGaN channel Semiconductor Science and Technology. 35: 75007
Pasayat SS, Hatui N, Li W, et al. (2020) Method of growing elastically relaxed crack-free AlGaN on GaN as substrates for ultra-wide bandgap devices using porous GaN Applied Physics Letters. 117: 62102
Pasayat SS, Ley R, Gupta C, et al. (2020) Color-tunable <10 μm square InGaN micro-LEDs on compliant GaN-on-porous-GaN pseudo-substrates Applied Physics Letters. 117: 61105
Pasayat SS, Gupta C, Wong MS, et al. (2020) Growth of strain-relaxed InGaN on micrometer-sized patterned compliant GaN pseudo-substrates Applied Physics Letters. 116: 111101
Liu W, Sayed I, Gupta C, et al. (2020) An improved methodology for extracting interface state density at Si3N4/GaN Applied Physics Letters. 116: 22104
Sayed I, Liu W, Chan S, et al. (2019) Flatband voltage stability and time to failure of MOCVD-grown SiO 2 and Si 3 N 4 dielectrics on N-polar GaN Applied Physics Express. 12: 121001
Gupta C, Tsukada Y, Romanczyk B, et al. (2019) First demonstration of improvement in hole conductivity in c-plane III-Nitrides through application of uniaxial strain Japanese Journal of Applied Physics. 58: 30908
See more...