Shinya Yoshida

Affiliations: 
Tohoku University, Sendai-shi, Miyagi-ken, Japan 
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"Shinya Yoshida"
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Miyaguchi H, Muroyama M, Yoshida S, et al. (2016) Development of a 17×17 Parallel Electron Beam Lithography System Ieej Transactions On Sensors and Micromachines. 136: 413-419
Inoue KY, Matsudaira M, Nakano M, et al. (2015) Advanced LSI-based amperometric sensor array with light-shielding structure for effective removal of photocurrent and mode selectable function for individual operation of 400 electrodes. Lab On a Chip. 15: 848-56
Miyaguchi H, Muroyama M, Yoshida S, et al. (2015) An LSI for Massive Parallel Electron Beam Lithography: Its Design and Evaluation Ieej Transactions On Sensors and Micromachines. 135: 374-381
Ikegami N, Kojima A, Miyaguchi H, et al. (2015) Review of Development and Performance Evaluation of Active-matrix Nanocrystalline Si Electron Emitter Array for Massively Parallel Electron Beam Direct-write Lithography Ieej Transactions On Sensors and Micromachines. 135: 221-229
Koshida N, Kojima A, Ikegami N, et al. (2015) Development of ballistic hot electron emitter and its applications to parallel processing: Active-matrix massive direct-write lithography in vacuum and thin-film deposition in solutions Journal of Micro/ Nanolithography, Mems, and Moems. 14
Hayasaka T, Yoshida S, Inoue KY, et al. (2015) Integration of Boron-Doped Diamond Microelectrode on CMOS-Based Amperometric Sensor Array by Film Transfer Technology Journal of Microelectromechanical Systems. 24: 958-967
Yoshida S, Hanzawa H, Wasa K, et al. (2014) Highly c-axis-oriented monocrystalline Pb(Zr, Ti)O₃ thin films on si wafer prepared by fast cooling immediately after sputter deposition. Ieee Transactions On Ultrasonics, Ferroelectrics, and Frequency Control. 61: 1552-8
Kojima A, Ikegami N, Yoshida T, et al. (2014) Massively parallel electron beam direct writing (MPEBDW) system based on micro-electro-mechanical system (MEMS)/nanocrystalineSi emitter array Proceedings of Spie. 9049: 904918
Yoshida S, Esashi M, Tanaka S. (2014) Development of UV-assisted ozone steam etching and investigation of its usability for SU-8 removal Journal of Micromechanics and Microengineering. 24: 035007
Hajika R, Yoshida S, Kanamori Y, et al. (2014) An investigation of the mechanical strengthening effect of hydrogen anneal for silicon torsion bar Journal of Micromechanics and Microengineering. 24: 105014
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