Year |
Citation |
Score |
2011 |
Jespersen ML, Mirau PA, Von Meerwall E, Vaia RA, Rodriguez R, Fernandes NJ, Giannelis EP. NMR characterization of canopy dynamics in nanoscale ionic materials Acs Symposium Series. 1077: 149-160. DOI: 10.1021/bk-2011-1077.ch009 |
0.428 |
|
2010 |
Fernandes N, Dallas P, Rodriguez R, Bourlinos AB, Georgakilas V, Giannelis EP. Fullerol ionic fluids. Nanoscale. 2: 1653-6. PMID 20820694 DOI: 10.1039/C0Nr00307G |
0.474 |
|
2010 |
Jespersen ML, Mirau PA, von Meerwall E, Vaia RA, Rodriguez R, Giannelis EP. Canopy dynamics in nanoscale ionic materials. Acs Nano. 4: 3735-42. PMID 20536222 DOI: 10.1021/Nn100112H |
0.517 |
|
2010 |
Zheng Y, Zhang J, Lan L, Yu P, Rodriguez R, Herrera R, Wang D, Giannelis EP. Preparation of solvent-free gold nanofluids with facile self-assembly technique. Chemphyschem : a European Journal of Chemical Physics and Physical Chemistry. 11: 61-4. PMID 19911406 DOI: 10.1002/Cphc.200900640 |
0.447 |
|
2010 |
Bae WJ, Trikeriotis M, Sha J, Schwartz EL, Rodriguez R, Zimmerman P, Giannelis EP, Ober CK. High refractive index and high transparency HfO2 nanocomposites for next generation lithography Journal of Materials Chemistry. 20: 5186-5189. DOI: 10.1039/C0Jm00679C |
0.547 |
|
2010 |
Fang J, Kelarakis A, Estevez L, Wang Y, Rodriguez R, Giannelis EP. Superhydrophilic and solvent resistant coatings on polypropylene fabrics by a simple deposition process Journal of Materials Chemistry. 20: 1651-1653. DOI: 10.1039/C000416M |
0.471 |
|
2010 |
Rodriguez R, Herrer R, Bourlinos AB, Li R, Amassian A, Archer LA, Giannelis EP. The synthesis and properties of nanoscale ionic materials Applied Organometallic Chemistry. 24: 581-589. DOI: 10.1002/Aoc.1625 |
0.488 |
|
2009 |
Trikeriotis M, Rodriguez R, Zettel MF, Bakandritsos A, Bae WJ, Zimmerman P, Ober CK, Giannelis EP. High-refractive index nanoparticle fluids for 193-nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814408 |
0.557 |
|
2009 |
Bae WJ, Trikeriotis M, Rodriguez R, Zettel MF, Piscani E, Ober CK, Giannelis EP, Zimmerman P. High index nanocomposite photoresist for 193 nm lithography Proceedings of Spie - the International Society For Optical Engineering. 7273. DOI: 10.1117/12.814154 |
0.559 |
|
2008 |
Zimmerman PA, Rice B, Rodriguez R, Zettel MF, Trikeriotis M, Wang D, Yi Y, Woo JB, Ober CK, Giannelis EP. The use of nanocomposite materials for high refractive index immersion lithography Journal of Photopolymer Science and Technology. 21: 621-629. DOI: 10.2494/Photopolymer.21.621 |
0.508 |
|
2008 |
Zimmerman PA, Byers J, Rice B, Ober CK, Giannelis EP, Rodriguez R, Wang D, O'Connor N, Lei X, Turro NJ, Liberman V, Palmacci S, Rothschild M, Lafferty N, Smith BW. Development and evaluation of a 193nm immersion generation-three fluid candidates Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772887 |
0.527 |
|
2008 |
Zimmerman PA, Byers J, Piscani E, Rice B, Ober CK, Giannelis EP, Rodriguez R, Wang D, Whittaker A, Blakey I, Chen L, Dargaville B, Liu H. Development of an operational high refractive index resist for 193nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6923. DOI: 10.1117/12.772871 |
0.547 |
|
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