| Year |
Citation |
Score |
| 2017 |
Sherwin S, Pistor TV, Neureuther A, Naulleau P. Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask Proceedings of Spie. 10143: 1014317. DOI: 10.1117/12.2260412 |
0.594 |
|
| 2015 |
Upadhyaya M, Basavalingappa A, Herbol H, Denbeaux G, Jindal V, Harris-Jones J, Jang IY, Goldberg KA, Mochi I, Marokkey S, Demmerle W, Pistor TV. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4913315 |
0.31 |
|
| 2002 |
Deng Y, Pistor T, Neureuther AR. Effects of multilayer mask roughness on extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 20: 344-349. DOI: 10.1116/1.1447252 |
0.695 |
|
| 2001 |
Neureuther A, Adam K, Hotta S, Pistor T, Robbins G, Deng Y. Simulation of image quality issues at low k1 for 100nm lithography Proceedings of Spie - the International Society For Optical Engineering. 4409: 33-40. DOI: 10.1117/12.438395 |
0.311 |
|
| 2001 |
Deng Y, Pistor T, Neureuther AR. Models for characterizing the printability of buried EUV defects Proceedings of Spie - the International Society For Optical Engineering. 4343: 551-558. DOI: 10.1117/12.436687 |
0.53 |
|
| 2001 |
Deng Y, Pistor T, Neureuther AR. Rigorous electromagnetic simulation applied to alignment systems Proceedings of Spie - the International Society For Optical Engineering. 4346: 1533-1540. DOI: 10.1117/12.435695 |
0.558 |
|
| 2001 |
Lee SI, Ng KC, Orimoto T, Pittenger J, Horie T, Adam K, Cheng M, Croffie E, Deng Y, Gennari F, Pistor T, Robins G, Williamson M, Wu B, Yuan L, et al. LAVA web-based remote simulation: Enhancements for education and technology innovation Proceedings of Spie - the International Society For Optical Engineering. 4346: 1500-1506. DOI: 10.1117/12.435691 |
0.438 |
|
| 2001 |
Pistor TV. Accuracy issues in the finite difference time domain simulation of photomask scattering Proceedings of Spie - the International Society For Optical Engineering. 4346: 1484-1491. DOI: 10.1117/12.435688 |
0.309 |
|
| 2001 |
Hotta S, Pistor TV, Adams K, Neureuther AR. Effects of shifter edge topography on through focus performance Proceedings of Spie - the International Society For Optical Engineering. 4186: 827-837. DOI: 10.1117/12.410765 |
0.531 |
|
| 2000 |
Pistor T, Deng Y, Neureuther A. Extreme ultraviolet mask defect simulation: Low-profile defects Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 18: 2926-2929. DOI: 10.1116/1.1324616 |
0.637 |
|
| 1999 |
Pistor T, Neureuther AR. Calculating aerial images from EUV masks Proceedings of Spie - the International Society For Optical Engineering. 3676: 679-696. |
0.49 |
|
| 1998 |
Pistor TV, Adam K, Neureuther A. Rigorous simulation of mask corner effects in extreme ultraviolet lithography Journal of Vacuum Science & Technology B. 16: 3449-3455. DOI: 10.1116/1.590476 |
0.618 |
|
| 1998 |
Adam K, Neureuther AR, Socha R, Pistor T. Analysis of sub-wavelength sized OPC features Microelectronic Engineering. 41: 137-140. DOI: 10.1016/S0167-9317(98)00030-6 |
0.666 |
|
| 1998 |
Pistor TV, Adam K, Neureuther A. Rigorous simulation of mask corner effects in extreme ultraviolet lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 16: 3449-3455. |
0.4 |
|
| 1997 |
Adam K, Socha RJ, Pistor TV, Neureuther AR. Simulating photomask edge roughness and corner rounding Proceedings of Spie - the International Society For Optical Engineering. 3050: 215-223. DOI: 10.1117/12.275911 |
0.586 |
|
| 1997 |
Pistor T, Neureuther AR. Simulation of reflective notching with TEMPEST Proceedings of Spie - the International Society For Optical Engineering. 3051: 595-605. |
0.324 |
|
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