Joanne W. Yim, Ph.D. - Publications

Affiliations: 
2011 Materials Science & Engineering University of California, Berkeley, Berkeley, CA, United States 

7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Toor F, Miller JB, Davidson LM, Duan W, Jura MP, Yim J, Forziati J, Black MR. Metal assisted catalyzed etched (MACE) black Si: optics and device physics. Nanoscale. PMID 27533490 DOI: 10.1039/C6Nr04506E  0.371
2014 Hainey M, Eichfeld SM, Shen H, Yim J, Black MR, Redwing JM. Aluminum-Catalyzed Growth of ‹110› Silicon Nanowires Journal of Electronic Materials. DOI: 10.1007/S11664-014-3565-8  0.346
2013 Eichfeld SM, Hainey MF, Shen H, Kendrick CE, Fucinato EA, Yim J, Black MR, Redwing JM. Vapor-liquid-solid growth of 〈110〉 silicon nanowire arrays Proceedings of Spie - the International Society For Optical Engineering. 8820. DOI: 10.1117/12.2026825  0.353
2011 Fan W, Cao J, Seidel J, Gu Y, Yim JW, Barrett C, Yu KM, Ji J, Ramesh R, Chen LQ, Wu J. Large kinetic asymmetry in the metal-insulator transition nucleated at localized and extended defects Physical Review B - Condensed Matter and Materials Physics. 83. DOI: 10.1103/Physrevb.83.235102  0.647
2009 Cao J, Ertekin E, Srinivasan V, Fan W, Huang S, Zheng H, Yim JW, Khanal DR, Ogletree DF, Grossman JC, Wu J. Strain engineering and one-dimensional organization of metal-insulator domains in single-crystal vanadium dioxide beams. Nature Nanotechnology. 4: 732-7. PMID 19893528 DOI: 10.1038/Nnano.2009.266  0.599
2009 Yim JW, Xiang B, Wu J. Sublimation of GeTe nanowires and evidence of its size effect studied by in situ TEM. Journal of the American Chemical Society. 131: 14526-30. PMID 19807191 DOI: 10.1021/Ja905808D  0.634
2007 Khanal DR, Yim JW, Walukiewicz W, Wu J. Effects of quantum confinement on the doping limit of semiconductor nanowires. Nano Letters. 7: 1186-90. PMID 17388639 DOI: 10.1021/Nl062886W  0.567
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