Alexander K. Raub, Ph.D. - Publications

Affiliations: 
2010 Engineering University of New Mexico, Albuquerque, NM, United States 
Area:
Electronics and Electrical Engineering, Optics Physics

11 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2011 Raub AK, Brueck SRJ. Large area 3D helical photonic crystals Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 29. DOI: 10.1116/1.3640756  0.88
2010 Raub AK, Brueck SRJ. Large area three-dimensional photonic crystals with embedded waveguides Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28. DOI: 10.1116/1.3507887  0.88
2010 Liu CC, Nealey PF, Raub AK, Hakeem PJ, Brueck SRJ, Han E, Gopalan P. Integration of block copolymer directed assembly with 193 immersion lithography Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: C6B30-C6B34. DOI: 10.1116/1.3501348  0.88
2009 Burckel DB, Washburn CM, Raub AK, Brueck SR, Wheeler DR, Brozik SM, Polsky R. Lithographically defined porous carbon electrodes. Small (Weinheim An Der Bergstrasse, Germany). 5: 2792-6. PMID 19823996 DOI: 10.1002/smll.200901084  0.88
2007 Raub AK, Li D, Frauenglass A, Brueck SRJ. Fabrication of 22 nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 25: 2224-2227. DOI: 10.1116/1.2801889  0.88
2006 Raub AK, Biswas AM, Borodovsky Y, Allen G, Brueck SRJ. Simulation of dense contact hole (κ 1=0.35) arrays with 193-nm immersion lithography Proceedings of Spie - the International Society For Optical Engineering. 6154. DOI: 10.1117/12.656694  0.88
2005 Abdallah DJ, Neisser M, Dammel RR, Pawlowski G, Ding S, Houlihan FM, Romano AR, Biafore JJ, Raub A. 193nm dual layer organic B.A.R.C.s for high NA immersion lithography Progress in Biomedical Optics and Imaging - Proceedings of Spie. 5753: 417-435. DOI: 10.1117/12.600736  0.88
2004 Raub AK, Frauenglass A, Brueck SRJ, Conley W, Dammel R, Romano A, Sato M, Hinsberg W. Deep-UV immersion interferometric lithography Proceedings of Spie - the International Society For Optical Engineering. 5377: 306-318. DOI: 10.1117/12.536772  0.88
2004 Raub AK, Frauenglass A, Brueck SRJ, Conley W, Dammel R, Romano A, Sato M, Hinsberg W. Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 22: 3459-3464. DOI: 10.1116/1.1824951  0.88
2003 Raub AK, Brueck SRJ. Deep UV immersion interferometric lithography Proceedings of Spie - the International Society For Optical Engineering. 5040: 667-678. DOI: 10.1117/12.482337  0.88
2001 Zhao YR, Yellowhair J, Lee J, Zhang S, Raub AK, Wang R, Varangis PM, El-Emawy AR, Vilela MF, Osiński M. Selective intermixing of InGaAs/GaAs/AlGaAs quantum wells with spin-on-glass/MgF2 grating caps Proceedings of Spie - the International Society For Optical Engineering. 4594: 144-155. DOI: 10.1117/12.446541  0.88
Show low-probability matches.