Gregory Denbeaux - Publications

Affiliations: 
Nanoscale Science and Engineering-Nanoscale Science State University of New York, Albany, Albany, NY, United States 
Area:
Nanoscience, Nanotechnology, Materials Science Engineering

23 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2016 Kandel Y, Denbeaux G. Simultaneous determination of electron beam profile and material response using self-consistent iterative method Japanese Journal of Applied Physics. 55. DOI: 10.7567/JJAP.55.086701  0.52
2015 Upadhyaya M, Jindal V, Basavalingappa A, Herbol H, Harris-Jones J, Jang IY, Goldberg KA, Mochi I, Marokkey S, Demmerle W, Pistor TV, Denbeaux G. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach Journal of Micro/ Nanolithography, Mems, and Moems. 14. DOI: 10.1117/1.JMM.14.2.023505  0.36
2015 Upadhyaya M, Basavalingappa A, Herbol H, Denbeaux G, Jindal V, Harris-Jones J, Jang IY, Goldberg KA, Mochi I, Marokkey S, Demmerle W, Pistor TV. Level-set multilayer growth model for predicting printability of buried native extreme ultraviolet mask defects Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 33. DOI: 10.1116/1.4913315  0.36
2014 Upadhyaya M, Jindal V, Herbol H, Jang IY, Kwon HJ, Harris-Jones J, Denbeaux G. Investigating printability of native defects on EUV mask blanks through simulations and experiments Proceedings of Spie - the International Society For Optical Engineering. 9048. DOI: 10.1117/12.2057761  0.48
2014 Upadhyaya M, Kandel Y, Denbeaux G, Montgomery C, Fan YJ. X-ray photoelectron spectroscopy process optimization for characterization of trace contamination elements for extreme ultraviolet resist outgassing study X-Ray Spectrometry. 43: 102-107. DOI: 10.1002/xrs.2522  0.52
2013 Upadhyaya M, Kandel Y, Denbeaux G, Montgomery C, Fan YJ. Optimizing XPS tool performance for characterizing trace contamination elements for EUV resist outgas testing Proceedings of Spie - the International Society For Optical Engineering. 8679. DOI: 10.1117/12.2018629  0.6
2012 Khopkar Y, Herbol H, Upadhyaya M, Denbeaux G, Jindal V, Kearney P. Developing particle detection test bench for vacuum components Proceedings of Spie - the International Society For Optical Engineering. 8322. DOI: 10.1117/12.919689  0.56
2011 Mbanaso C, Denbeaux G, Antohe A, Bull H, Goodwin F, Hershcovitch A. Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879550  0.36
2011 Mbanaso C, Kruger S, Higgins C, Khopkar Y, Antohe A, Cardineau B, Denbeaux G. Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879507  0.36
2011 Khopkar Y, Thomas P, Yankulin L, Garg R, Mbanaso C, Antohe A, Upadhyaya M, Kamineni VK, Fan YJ, Denbeaux G, Jindal V, Wüest A, Gullikson E. Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879491  0.36
2010 Thomas P, Yankulin L, Khopkar Y, Garg R, Mbanaso C, Antohe A, Fan YJ, Denbeaux G, Aouadi S, Jindal V, Wüest A. Wavelength dependence of carbon contamination on mirrors with different capping layers Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.847015  0.6
2010 Fan YJ, Yankulin L, Thomas P, Mbanaso C, Antohe A, Garg R, Wang Y, Murray T, Wüest A, Goodwin F, Huh S, Cordes A, Naulleau P, Goldberg K, Mochi I, ... ... Denbeaux G, et al. Carbon contamination topography analysis of EUV masks Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846996  0.36
2009 Antohe AO, Mbanaso C, Fan YJ, Yankulin L, Garg R, Thomas P, Denbeaux G, Piscani EC, Wuest AF. EUV resist outgassing - Scaling to HVM intensity Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.816555  0.48
2009 Fan YJ, Yankulin L, Antohe A, Garg R, Thomas P, Mbanaso C, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814196  0.4
2009 Jindal V, Garg R, Denbeaux G, Wüest A. Assumptions and trade-offs of extreme ultraviolet optics contamination modeling Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814188  0.32
2008 Garg R, Naulleau P, Brainard R, Denbeaux G. Proximity printing using extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772869  0.44
2008 Garg R, Wüest A, Gullikson E, Bajt S, Denbeaux G. EUV optics contamination studies in presence of selected hydrocarbons Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772770  0.36
2008 Waterman J, Mbanaso C, Denbeaux G. Vacuum induced photoresist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772701  0.56
2008 Mbanaso C, Denbeaux G, Dean K, Brainard R, Kruger S, Hassanein E. Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772695  0.4
2008 Denbeaux G, Garg R, Mbanaso C, Waterman J, Yankulin L, Antohe A, Fan YJ, Montgomery W, Dean K, Orvek K, Wüest A, Wei Y, Goodwin F, Wood O, Koay CS, et al. Extreme ultraviolet resist outgassing and its effect on nearby optics Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772670  0.36
2007 Denbeaux G, Garg R, Waterman J, Mbanaso C, Netten J, Brainard R, Fan YJ, Yankulin L, Antohe A, DeMarco K, Jaffe M, Waldron M, Dean K. Quantitative measurement of EUV resist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6533. DOI: 10.1117/12.737192  0.44
2007 Garg R, Antohe A, Denbeaux G. Absorption measurements of extreme ultraviolet radiation in photoresists Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.712427  0.68
2006 Garg R, Evertsen J, Denbeaux G. Novel method for fabrication of high efficiency optics for short wavelength radiation Proceedings of Spie - the International Society For Optical Engineering. 6110. DOI: 10.1117/12.646492  0.72
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