Fee L. Lie, Ph.D. - Publications

2011 Chemical Engineering University of Arizona, Tucson, AZ 
Chemical Engineering, Materials Science Engineering, Electronics and Electrical Engineering

7 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2013 Granados-Alpizar B, Li Lie F, Muscat AJ. Interfacial chemistry of hydrofluoric acid-treated In0.53Ga 0.47As(100) during atomic layer deposition of aluminum oxide Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 31. DOI: 10.1116/1.4770288  1
2011 Lie FL, Rachmady W, Muscat AJ. Oxide removal and selective etching of in from InSb(100) with TiCl 4 Journal of Physical Chemistry C. 115: 19733-19740. DOI: 10.1021/jp204408n  1
2011 Lie FL, Muscat AJ. Controlled oxide removal and surface morphology on InSb(100) using gas phase HF/H2O Journal of Physical Chemistry C. 115: 7440-7449. DOI: 10.1021/jp110151y  1
2010 Imangholi B, Lie FL, Parks HG, Muscat AJ. Effect of deep-level defects on surface recombination velocity at the interface between silicon and dielectric films Ieee Transactions On Electron Devices. 57: 877-889. DOI: 10.1109/TED.2010.2041283  1
2010 Lie FL, Rachmady W, Muscat AJ. In0.53Ga0.47As(1 0 0) native oxide removal by liquid and gas phase HF/H2O chemistries Microelectronic Engineering. 87: 1656-1660. DOI: 10.1016/j.mee.2009.12.070  1
2009 Deng Z, Lie FL, Shen S, Ghosh I, Mansuripur M, Muscat AJ. Water-based route to ligand-selective synthesis of ZnSe and Cd-doped ZnSe quantum dots with tunable ultraviolet A to blue photoluminescence. Langmuir : the Acs Journal of Surfaces and Colloids. 25: 434-42. PMID 19053829 DOI: 10.1021/la802294e  1
2009 Lie FL, Rachmady W, Muscat AJ. A comparison of liquid and gas phase surface preparation of III-V compound semiconductors for atomic layer deposition Microelectronic Engineering. 86: 122-127. DOI: 10.1016/j.mee.2008.07.004  1
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