| Year |
Citation |
Score |
| 2011 |
Khopkar Y, Thomas P, Yankulin L, Garg R, Mbanaso C, Antohe A, Upadhyaya M, Kamineni VK, Fan YJ, Denbeaux G, Jindal V, Wüest A, Gullikson E. Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879491 |
0.751 |
|
| 2010 |
Garg R, Faradzhev N, Hill S, Richter L, Shaw PS, Vest R, Lucatorto TB. A simple null-field ellipsometric imaging system (NEIS) for in-situ monitoring of EUV-induced deposition on EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.855967 |
0.51 |
|
| 2010 |
Thomas P, Yankulin L, Khopkar Y, Garg R, Mbanaso C, Antohe A, Fan YJ, Denbeaux G, Aouadi S, Jindal V, Wüest A. Wavelength dependence of carbon contamination on mirrors with different capping layers Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.847015 |
0.757 |
|
| 2010 |
Fan YJ, Yankulin L, Thomas P, Mbanaso C, Antohe A, Garg R, Wang Y, Murray T, Wüest A, Goodwin F, Huh S, Cordes A, Naulleau P, Goldberg K, Mochi I, et al. Carbon contamination topography analysis of EUV masks Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846996 |
0.767 |
|
| 2010 |
Fan YJ, Yankulin L, Antohe A, Thomas P, Mbanaso C, Garg R, Wang Y, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Effect of carbon contamination on the printing performance of extreme ultraviolet masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 321-328. DOI: 10.1116/1.3333434 |
0.771 |
|
| 2009 |
Antohe AO, Mbanaso C, Fan YJ, Yankulin L, Garg R, Thomas P, Denbeaux G, Piscani EC, Wuest AF. EUV resist outgassing - Scaling to HVM intensity Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.816555 |
0.755 |
|
| 2009 |
Fan YJ, Yankulin L, Antohe A, Garg R, Thomas P, Mbanaso C, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814196 |
0.762 |
|
| 2009 |
Jindal V, Garg R, Denbeaux G, Wüest A. Assumptions and trade-offs of extreme ultraviolet optics contamination modeling Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814188 |
0.733 |
|
| 2008 |
Garg R, Naulleau P, Brainard R, Denbeaux G. Proximity printing using extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772869 |
0.664 |
|
| 2008 |
Garg R, Wüest A, Gullikson E, Bajt S, Denbeaux G. EUV optics contamination studies in presence of selected hydrocarbons Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772770 |
0.742 |
|
| 2008 |
Denbeaux G, Garg R, Mbanaso C, Waterman J, Yankulin L, Antohe A, Fan YJ, Montgomery W, Dean K, Orvek K, Wüest A, Wei Y, Goodwin F, Wood O, Koay CS, et al. Extreme ultraviolet resist outgassing and its effect on nearby optics Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772670 |
0.752 |
|
| 2007 |
Dean KR, Denbeaux G, Wüest A, Garg R. EUV resist outgassing: How much is too much? Journal of Photopolymer Science and Technology. 20: 393-402. DOI: 10.2494/Photopolymer.20.393 |
0.687 |
|
| 2007 |
Garg R, Antohe A, Denbeaux G. Absorption measurements of extreme ultraviolet radiation in photoresists Proceedings of Spie - the International Society For Optical Engineering. 6517. DOI: 10.1117/12.712427 |
0.647 |
|
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