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Chimaobi Mbanaso, Ph.D. - Publications

Affiliations: 
2011 Nanoscale Science and Engineering-Nanoscale Engineering State University of New York, Albany, Albany, NY, United States 
Area:
Nanoscience, Nanotechnology
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15 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2012 Mbanaso C, Antohe A, Bull H, Goodwin F, Hershcovitch A, Denbeaux G. Out-of-band radiation mitigation at 10.6m by molecular absorbers in laser-produced plasma extreme ultraviolet sources Journal of Micro/Nanolithography, Mems, and Moems. 11. DOI: 10.1117/1.Jmm.11.2.021116  0.636
2011 Mbanaso C, Denbeaux G, Antohe A, Goodwin F, Hershcovitch A. Gaseous spectral filters to mitigate infrared radiation Spie Newsroom. DOI: 10.1117/2.1201101.003424  0.306
2011 Mbanaso C, Denbeaux G, Antohe A, Bull H, Goodwin F, Hershcovitch A. Gas-based spectral filter for mitigating 10.6 μm radiation in CO 2 laser produced plasma extreme ultraviolet sources Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879550  0.648
2011 Mbanaso C, Kruger S, Higgins C, Khopkar Y, Antohe A, Cardineau B, Denbeaux G. Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879507  0.64
2011 Khopkar Y, Thomas P, Yankulin L, Garg R, Mbanaso C, Antohe A, Upadhyaya M, Kamineni VK, Fan YJ, Denbeaux G, Jindal V, Wüest A, Gullikson E. Dependence of contamination rates on key parameters in EUV optics Proceedings of Spie - the International Society For Optical Engineering. 7969. DOI: 10.1117/12.879491  0.737
2010 Thomas P, Yankulin L, Khopkar Y, Garg R, Mbanaso C, Antohe A, Fan YJ, Denbeaux G, Aouadi S, Jindal V, Wüest A. Wavelength dependence of carbon contamination on mirrors with different capping layers Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.847015  0.75
2010 Fan YJ, Yankulin L, Thomas P, Mbanaso C, Antohe A, Garg R, Wang Y, Murray T, Wüest A, Goodwin F, Huh S, Cordes A, Naulleau P, Goldberg K, Mochi I, et al. Carbon contamination topography analysis of EUV masks Proceedings of Spie - the International Society For Optical Engineering. 7636. DOI: 10.1117/12.846996  0.753
2010 Fan YJ, Yankulin L, Antohe A, Thomas P, Mbanaso C, Garg R, Wang Y, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Effect of carbon contamination on the printing performance of extreme ultraviolet masks Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics. 28: 321-328. DOI: 10.1116/1.3333434  0.755
2009 Antohe AO, Mbanaso C, Fan YJ, Yankulin L, Garg R, Thomas P, Denbeaux G, Piscani EC, Wuest AF. EUV resist outgassing - Scaling to HVM intensity Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.816555  0.746
2009 Fan YJ, Yankulin L, Antohe A, Garg R, Thomas P, Mbanaso C, Wüest A, Goodwin F, Huh S, Naulleau P, Goldberg K, Mochi I, Denbeaux G. Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging Proceedings of Spie - the International Society For Optical Engineering. 7271. DOI: 10.1117/12.814196  0.746
2008 Waterman J, Mbanaso C, Denbeaux G. Vacuum induced photoresist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772701  0.684
2008 Mbanaso C, Denbeaux G, Dean K, Brainard R, Kruger S, Hassanein E. Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772695  0.66
2008 Tarrio C, Benner BA, Vest RE, Grantham S, Hill SB, Lucatorto TB, Hendricks JH, Abbott P, Denbeaux G, Mbanaso C, Antohe A, Orvek K, Choi KW. Quantitative measurement of outgas products from EUV photoresists Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772686  0.655
2008 Denbeaux G, Garg R, Mbanaso C, Waterman J, Yankulin L, Antohe A, Fan YJ, Montgomery W, Dean K, Orvek K, Wüest A, Wei Y, Goodwin F, Wood O, Koay CS, et al. Extreme ultraviolet resist outgassing and its effect on nearby optics Proceedings of Spie - the International Society For Optical Engineering. 6921. DOI: 10.1117/12.772670  0.748
2007 Denbeaux G, Garg R, Waterman J, Mbanaso C, Netten J, Brainard R, Fan YJ, Yankulin L, Antohe A, DeMarco K, Jaffe M, Waldron M, Dean K. Quantitative measurement of EUV resist outgassing Proceedings of Spie - the International Society For Optical Engineering. 6533. DOI: 10.1117/12.737192  0.682
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