☰

Lin Sha, Ph.D. - Publications

Affiliations: 
2003 University of California, Los Angeles, Los Angeles, CA 
Area:
Chemical Engineering
Tree Info Similar researchers PubMed Report error

8 high-probability publications. We are testing a new system for linking publications to authors. You can help! If you notice any inaccuracies, please sign in and mark papers as correct or incorrect matches. If you identify any major omissions or other inaccuracies in the publication list, please let us know.

Year Citation  Score
2007 Sha L. Characteristics of HF CVD diamond thin films on cemented carbides Surface Review and Letters. 14: 451-459. DOI: 10.1142/S0218625X07009529  0.306
2004 Sha L, Chang JP. Plasma etching of high dielectric constant materials on silicon in halogen chemistries Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 22: 88-95. DOI: 10.1116/1.1627771  0.513
2004 Ni D, Lou Y, Christofides PD, Sha L, Lao S, Chang JP. Real-time carbon content control for PECVD ZrO/sub 2/ thin-film growth Ieee Transactions On Semiconductor Manufacturing. 17: 221-230. DOI: 10.1109/Tsm.2004.826939  0.507
2004 Huang TJ, Tseng HR, Sha L, Lu W, Brough B, Flood AH, Yu BD, Celestre PC, Chang JP, Stoddart JF, Ho CM. Mechanical shuttling of linear motor-molecules in condensed phases on solid substrates Nano Letters. 4: 2065-2071. DOI: 10.1021/Nl035099X  0.459
2003 Sha L, Chang JP. Plasma etching selectivity of ZrO2 to Si in BCl3/Cl2 plasmas Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 21: 1915-1922. DOI: 10.1116/1.1615975  0.424
2002 Sha L, Cho BO, Chang JP. Ion-enhanced chemical etching of ZrO2 in a chlorine discharge Journal of Vacuum Science and Technology a: Vacuum, Surfaces and Films. 20: 1525-1531. DOI: 10.1116/1.1491267  0.458
2002 Cho BO, Wang J, Sha L, Chang JP. Tuning the electrical properties of zirconium oxide thin films Applied Physics Letters. 80: 1052-1054. DOI: 10.1063/1.1448667  0.509
2001 Cho BO, Lao S, Sha L, Chang JP. Spectroscopic study of plasma using zirconium tetra-tert-butoxide for the plasma enhanced chemical vapor deposition of zirconium oxide Journal of Vacuum Science and Technology, Part a: Vacuum, Surfaces and Films. 19: 2751-2761. DOI: 10.1116/1.1403717  0.549
Show low-probability matches.