Year |
Citation |
Score |
2007 |
Lu KC, Wu WW, Wu HW, Tanner CM, Chang JP, Chen LJ, Tu KN. In situ control of atomic-scale Si layer with huge strain in the nanoheterostructure NiSi/Si/NiSi through point contact reaction. Nano Letters. 7: 2389-94. PMID 17604405 DOI: 10.1021/Nl071046U |
0.486 |
|
2007 |
Tanner CM, Toney MF, Lu J, Blom HO, Sawkar-Mathur M, Tafesse MA, Chang JP. Engineering epitaxial γ -Al2 O3 gate dielectric films on 4H-SiC Journal of Applied Physics. 102. DOI: 10.1063/1.2812609 |
0.583 |
|
2007 |
Tanner CM, Perng YC, Frewin C, Saddow SE, Chang JP. Electrical performance of Al2O3 gate dielectric films deposited by atomic layer deposition on 4H-SiC Applied Physics Letters. 91. DOI: 10.1063/1.2805742 |
0.659 |
|
2007 |
Tanner CM, Sawkar-Mathur M, Lu J, Blom HO, Toney MF, Chang JP. Structural properties of epitaxial γ- Al2O3 (111) thin films on 4H-SiC (0001) Applied Physics Letters. 90. DOI: 10.1063/1.2435978 |
0.614 |
|
2007 |
Tanner CM, Choi J, Chang JP. Electronic structure and band alignment at the Hf O2 4H-SiC interface Journal of Applied Physics. 101. DOI: 10.1063/1.2432402 |
0.631 |
|
2006 |
Tanner CM, Lu J, Blom HO, Chang JP. Structural and Morphological Properties of Ultrathin HfO2 Dielectrics on 4H-SiC (0001) Materials Science Forum. 1075-1078. DOI: 10.4028/Www.Scientific.Net/Msf.527-529.1075 |
0.596 |
|
2006 |
Tanner CM, Choi J, Chang JP. Experimental and first-principles studies of the band alignment at the HfO2/4H-SiC (0001) interface Materials Science Forum. 527: 1071-1074. DOI: 10.4028/Www.Scientific.Net/Msf.527-529.1071 |
0.658 |
|
2006 |
Tanner CM, Lu J, Blom H, Chang JP. Growth of Epitaxial γ-Al2O3 Dielectrics on 4H-SiC Mrs Proceedings. 911. DOI: 10.1557/Proc-0911-B10-06 |
0.621 |
|
2006 |
Tanner CM, Lu J, Blom HO, Chang JP. Growth of epitaxial γ-Al 2O 3 dielectrics on 4H-SiC Materials Research Society Symposium Proceedings. 911: 341-345. |
0.446 |
|
2006 |
Tanner CM, Lu J, Blom HO, Chang JP. Structural and morphological properties of ultrathin HfO2 dielectrics on 4H-SiC (0001) Materials Science Forum. 527: 1075-1078. |
0.418 |
|
2005 |
Tanner CM, Choi J, Chang JP. Material and electrical properties of ultrathin HfO 2 films on 4H-SiC (0001) Ecs Transactions. 1: 149-151. |
0.504 |
|
2005 |
Choi J, Puthenkovilakam R, Tanner CM, Chang JP. Determination of band offsets at the AlN/SiC interface Ecs Transactions. 1: 220-227. |
0.62 |
|
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